patentstorm.us 258 85 http://www.patentstorm.us/ http://www.patentstorm.us/images/logo.gif PatentStorm -> Applications -> Radiation imagery chemistry: process, composition, or product thereof http://www.patentstorm.us/rss/class/applications/rss-430.xml Recent patent applications filings in USPTO Class 430 Radiation imagery chemistry: process, composition, or product thereof. Thu, 16 Feb 2012 15:00:45 patents@patentstorm.us en <![CDATA[Top Coating Composition]]> http://www.patentstorm.us/applications/20120040294/description.html
  • Application Number:  20120040294
  • Publication Date:  2012-02-16
  • Inventors:  Maeda, Kazuhiko; Mori, Kazunori; Komoriya, Haruhiko; Narizuka, Satoru; Isono, Yoshimi; Kitamoto, Takamasa
    • Disclosed is a top coating composition formed on a resist film, for protecting the resist film, the top coating composition being a top coating composition for photoresist, characterized by containing a fluorine-containing polymer having a repeating unit represented by the following general formula (1). This composition is capable of controlling developing solution solubility and has a high water repellency.

    [In the formula, R1 ...
    ]]> 20120040294 <![CDATA[REFLECTIVE MASK, MANUFACTURING METHOD FOR REFLECTIVE MASK, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE]]> http://www.patentstorm.us/applications/20120040293/description.html

  • Application Number:  20120040293
  • Publication Date:  2012-02-16
  • Inventors:  Nakajima, Yumi; Inanami, Ryoichi; Itoh, Masamitsu
    • A reflective mask comprising: a reflective layer that is arranged on a surface on a side on which EUV light is irradiated and reflects the EUV light; a buffer layer containing Cr that is arranged on a side of the reflective layer on which the EUV light is irradiated and covers an entire surface of the reflective layer; and a non-reflective layer that is arranged on a side of the buffer layer on which the EUV light is irradiated and in which an absorber that absorbs the irradiated EUV light is ...
    ]]>     20120040293     <![CDATA[TRANSFER METHOD, TRANSFER APPARATUS, AND METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING ELEMENT]]> http://www.patentstorm.us/applications/20120040292/description.html
  • Application Number:  20120040292
  • Publication Date:  2012-02-16
  • Inventor:  Hanawa, Kohji
    • A transfer method and a transfer apparatus capable of making the shape and quality of a transferred layer uniform and a method of manufacturing an organic light emitting element. A transfer method includes a step of disposing a transfer substrate and an acceptor substrate so as to face each other, a transfer layer being provided on the transfer substrate, and a plurality of areas being arranged in the acceptor substrate, and transferring the transfer layer to the plurality of areas by emitting ...
    ]]>     20120040292     <![CDATA[COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY]]> http://www.patentstorm.us/applications/20120040291/description.html
  • Application Number:  20120040291
  • Publication Date:  2012-02-16
  • Inventors:  Endo, Takafumi; Sakamoto, Rikimaru; Ho, Bangching
    • There is provided a compositions of resist underlayer films for EUV lithography that is used in a production process of devices employing EUV lithography, that reduces adverse effects caused by EUV, and that has a beneficial effect on the formation of a favorable resist pattern; and a method for forming resist patterns using the composition of resist underlayer films for EUV lithography. A composition for forming a resist underlayer film for an EUV lithography process used in production of a ...
    ]]>     20120040291     <![CDATA[PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMATION METHOD AND PRINTED CIRCUIT BOARD PRODUCTION METHOD EACH UTILIZING SAME]]> http://www.patentstorm.us/applications/20120040290/description.html
  • Application Number:  20120040290
  • Publication Date:  2012-02-16
  • Inventors:  Ishi, Mitsuru; Ajioka, Yoshiki; Iso, Junichi; Usuba, Manami
    • The present invention relates to a photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizable compound having an ethylenically unsaturated bond and (C) a photopolymerization initiator, wherein the (C) photopolymerization initiator comprises a compound represented by the following general formula (1). In formula (1), R1 represents a halogen atom, an amino group, a carboxyl group, a C1-6 alkyl group, a C1-6 alkoxy group or a C1-6 alkylamino group and m ...
    ]]>     20120040290     <![CDATA[CHEMICALLY AMPLIFIED SILSESQUIOXANE RESIST COMPOSITIONS]]> http://www.patentstorm.us/applications/20120040289/description.html
  • Application Number:  20120040289
  • Publication Date:  2012-02-16
  • Inventors:  Bozano, Luisa Dominica; Davis, Blake W.; Nelson, Alshakim; Sundberg, Linda Karin; Rathore, Jitendra Singh
    • The present invention provides chemically amplified silsesquioxane polymers for preparing masks using e-beam lithography. The silsesquioxane polymers have reactive sidechains that in the presence of an acid undergo acid catalyzed rearrangement to generate reactive functionalities that crosslink to form Si—O—Si bonds. The reactive side-chains comprise β- and γ-substituted alkyl groups bound to the silicon of the silsesquioxane polymer. The substituent of the β- and γ-substituted alkyl ...
    ]]>     20120040289     <![CDATA[Epoxy formulations with controllable photospeed]]> http://www.patentstorm.us/applications/20120040288/description.html
  • Application Number:  20120040288
  • Publication Date:  2012-02-16
  • Inventors:  Adams, Timothy; doCanto, Manuel; Cernigliaro, George
    • The present invention is directed to an epoxy film composition, comprising: novolac resin; solvent; a photoacid generator having the structure A+B− and having a pKa of −5 or less; and a photolabile quencher generator having the structure C+D− and having a pKa greater than −10; wherein B− and D− are different; wherein the amount of the photoacid generator ranges from 0.1 to 7 wt %, based on the total weight of the ...
    ]]>     20120040288     <![CDATA[TONER PRODUCTION PROCESS AND TONER]]> http://www.patentstorm.us/applications/20120040285/description.html
  • Application Number:  20120040285
  • Publication Date:  2012-02-16
  • Inventors:  Kato, Masayoshi; Chimoto, Yuya; Shibata, Takaho; Toyoda, Takayuki; Higashi, Ryuji; Natori, Ryo
    • A process for producing a core-shell toner is provided in which the toner has core particles containing at least a binder resin (1), a colorant and a release agent and shell layers which contain at least a resin (2) and with which the core particles are covered; and the process including the steps of (A) mixing a binder resin-(1) dispersion, a colorant dispersion and a release agent dispersion, (B) adding to a mixed dispersion thus obtained an agglomerating agent to effect ...
    ]]>     20120040285     <![CDATA[ELECTROSTATIC IMAGE-DEVELOPING TONER, ELECTROSTATIC IMAGE DEVELOPER, TONER CARTRIDGE, PROCESS CARTRIDGE, AND IMAGE FORMING APPARATUS]]> http://www.patentstorm.us/applications/20120040284/description.html
  • Application Number:  20120040284
  • Publication Date:  2012-02-16
  • Inventors:  YOSHINO, Susumu; HIRAOKA, Satoshi; YANAGIDA, Kazuhiko; SEITOKU, Shigeru; YAMASAKI, Sumiaki; SHIOZAKI, Hirofumi
    • An electrostatic image developing toner that includes a toner particle including a binder resin containing a resin selected from an acrylic resin, a styrene-acrylic resin, and a styrene-(meth)acrylic acid ester copolymer. The resin has a crosslinked structure formed by using at least one of boric acid and boric acid ...
    ]]>     20120040284     <![CDATA[IMAGING MEMBERS FOR INK-BASED DIGITAL PRINTING COMPRISING STRUCTURED ORGANIC FILMS]]> http://www.patentstorm.us/applications/20120040283/description.html
  • Application Number:  20120040283
  • Publication Date:  2012-02-16
  • Inventors:  Chow, Eugene M.; Hu, Nan-Xing; Heuft, Matthew A.; Côté, Adrien P.
    • An imaging member for ink-based digital printing having an outermost layer including a structured organic film (SOF) having a plurality of segments and a plurality of linkers arranged as a covalent organic framework, wherein the structured organic film may be multi-segment ...
    ]]>     20120040283     <![CDATA[IMAGING DEVICES COMPRISING STRUCTURED ORGANIC FILMS]]> http://www.patentstorm.us/applications/20120040282/description.html
  • Application Number:  20120040282
  • Publication Date:  2012-02-16
  • Inventors:  HEUFT, Matthew A.; Mahabadi, Hadi K.; Hu, Nan-Xing; Côté, Adrien P.
    • An imaging member for a xerographic liquid immersion development machine having an outermost layer including a solvent resistant structured organic film (SOF) having a plurality of segments and a plurality of linkers arranged as a covalent organic framework, wherein the structured organic film may be multi-segment ...
    ]]>     20120040282     <![CDATA[Curable Sublimation Toner And Sublimation Transfer Process Using Same]]> http://www.patentstorm.us/applications/20120040281/description.html
  • Application Number:  20120040281
  • Publication Date:  2012-02-16
  • Inventors:  Ng, Tie Hwee; Saban, Marko; Zhou, Ke; Wang, Yulin
    • A transfer printing method including applying a curable sublimation toner having at least one curable component and at least one sublimation colorant in a desired pattern onto a transfer substrate to form an image on the transfer substrate at a first temperature which is below the sublimation temperature of the sublimation colorant; wherein the curable sublimation toner is a conventional toner or a chemical toner; and wherein the curable sublimation toner includes at least one curable amorphous ...
    ]]>     20120040281     <![CDATA[Simultaneous Optical Proximity Correction and Decomposition for Double Exposure Lithography]]> http://www.patentstorm.us/applications/20120040280/description.html
  • Application Number:  20120040280
  • Publication Date:  2012-02-16
  • Inventors:  Agarwal, Kanak B.; Banerjee, Shayak
    • A mechanism is provided for simultaneous optical proximity correction (OPC) and decomposition for double exposure lithography. The mechanism begins with two masks that are equal to each other and to the target. The mechanism simultaneously optimizes both masks to obtain a wafer image that both matches the target and is robust to process variations. The mechanism develops a lithographic cost function that optimizes for contour fidelity as well as robustness to variation. The mechanism minimizes ...
    ]]>     20120040280     <![CDATA[METHOD, DEVICE, AND SYSTEM FOR FORMING CIRCULAR PATTERNS ON A SURFACE]]> http://www.patentstorm.us/applications/20120040279/description.html
  • Application Number:  20120040279
  • Publication Date:  2012-02-16
  • Inventors:  Tucker, Michael; Fujimura, Akira
    • A stencil for character projection (CP) charged particle beam lithography and a method for manufacturing the stencil is disclosed, where the stencil contains two circular characters, where each character is capable of forming patterns on a surface in a range of sizes by using different dosages, and where the size ranges for the two characters is continuous. A method for forming circular patterns on a surface using variable-shaped beam (VSB) shots of different dosages is also disclosed. A method ...
    ]]>     20120040279     <![CDATA[INTENSITY SELECTIVE EXPOSURE PHOTOMASK]]> http://www.patentstorm.us/applications/20120040278/description.html
  • Application Number:  20120040278
  • Publication Date:  2012-02-16
  • Inventors:  Liu, George; Gau, Tsai-Sheng; Yeh, Chih-Yang; Huang, Wen-Chun; Cheng, Ying-Chou; Huang, Te-Chih; Chen, Kuei Shun; Liu, Wen-Hao; Luo, Boren; Ou, Tsong-Hua; Tang, Yu-Po; Liu, Yu Lun; Liu, Ru-Gun; Lu, Shu-Chen; Ku, Yao-Ching
    • An intensity selective exposure photomask, also describes as a gradated photomask, is provided. The photomask includes a first region including a first array of sub-resolution features. The first region blocks a first percentage of the incident radiation. The photomask also includes a second region including a second array of sub-resolution features. The second region blocks a second percentage of the incident radiation different that the first ...
    ]]>     20120040278     <![CDATA[DAMASCENE RETICLE AND METHOD OF MANUFACTURE THEREOF]]> http://www.patentstorm.us/applications/20120040277/description.html
  • Application Number:  20120040277
  • Publication Date:  2012-02-16
  • Inventors:  Hibbs, Michael S.; Petrarca, Kevin S.; Krishnan, Mahadevaiyer; Canaperi, Donald F.; Mih, Rebecca D.; Steen, Steven; Grabarz, Henry
    • A reticle carrier for a polishing tool capable of accommodating a reticle includes a base plate with an obverse and reverse surfaces, a retaining ring secured to the obverse surface of the base plate forming a recess defined by the obverse surface of the rigid base plate and internal edges of the retaining ring. A reticle pad supports a reticle in the recess. The base plate and the reticle pad having an array of matching, aligned passageway holes therethrough for exhaustion of air from space ...
    ]]>     20120040277     <![CDATA[METHOD OF FORMING AND USING PHOTOLITHOGRAPHY MASK HAVING A SCATTERING BAR STRUCTURE]]> http://www.patentstorm.us/applications/20120040276/description.html
  • Application Number:  20120040276
  • Publication Date:  2012-02-16
  • Inventors:  Yen, Yung-Sung; Lai, Chien-Wen; Chen, Kuei Shun; Tsay, Cherng-Shyan
    • A method of forming a photolithography mask including forming a first linear non-dense feature on the mask and forming a plurality of parallel linear assist features disposed substantially perpendicular to the at least one linear non-dense design feature. In an embodiment, the photolithography mask further includes a first transverse linear assist feature disposed substantially transverse to the plurality of parallel linear assist ...
    ]]>     20120040276     <![CDATA[PHOTORESIST COMPOSITIONS]]> http://www.patentstorm.us/applications/20120038996/description.html
  • Application Number:  20120038996
  • Publication Date:  2012-02-16
  • Inventors:  Kunimoto, Kazuhiko; Ohwa, Masaki; Nesvadba, Peter; Kura, Hisatoshi; Sameshima, Kaori
    • The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking. The present invention relates to a radically polymerizable composition comprising: (a) at least one alkaline developable resin; (b) at least one acrylate monomer; (c) at ...
    ]]>     20120038996     <![CDATA[COLOR FILTER AND LIQUID CRYSTAL DISPLAY DEVICE, AND EXPOSURE MASK]]> http://www.patentstorm.us/applications/20120038866/description.html
  • Application Number:  20120038866
  • Publication Date:  2012-02-16
  • Inventors:  Matsui, Kohei; Yasui, Ryosuke
    • A color filter which is able to form a liquid crystal display device that has few variation in display caused due to difference in exposure illuminance among exposure heads and/or misalignment in pattern position, and that is excellent in display quality, and an exposure mask used for producing the color filter are provided. A color filter 1 includes: a substrate 2; black matrixes 3 provided on the substrate 2; and a plurality of colored layers 4 which ...
    ]]>     20120038866     <![CDATA[COLOR FILTER, LIQUID CRYSTAL DISPLAY DEVICE,AND COLOR FILTER PRODUCTION METHOD]]> http://www.patentstorm.us/applications/20120038863/description.html
  • Application Number:  20120038863
  • Publication Date:  2012-02-16
  • Inventors:  Matsui, Kohei; Yasui, Ryosuke
    • A color filter is provided which is formed by using a small mask continuous exposure method in which a portion between adjacent exposed areas is shielded from light by a blind shutter, and which has dummy photo spacers formed on a colored layer outside a display pixel area at a uniform height. Firstly, by using the small mask continuous exposure method, a colored layer is formed which extends in the X-axis direction astride the display pixel area and a frame area. At this time, the edges of the ...
    ]]>     20120038863     <![CDATA[Structure for Multi-Row Leadframe and Semiconductor Package Thereof and Manufacture Method Thereof]]> http://www.patentstorm.us/applications/20120038036/description.html
  • Application Number:  20120038036
  • Publication Date:  2012-02-16
  • Inventors:  Lee, Sung Won; Ryu, Sung Wuk; Lee, Hyuk Soo; Chun, Hyun A.; Choi, Jae Bong; Eom, Sai Ran
    • The present invention relates to a multi-row leadframe for semiconductor packaging, characterized by: forming a plating pattern on a leadframe material (first step); forming a protective pattern on the plating pattern (second step); and forming a nano pattern by using the protective pattern as a mask (third step), whereby a protective pattern is formed on an upper surface of a plating pattern to increase reliability of a product by preventing damage to a plating layer caused by etching solution ...
    ]]>     20120038036     <![CDATA[OVERLAY MARK ENHANCEMENT FEATURE]]> http://www.patentstorm.us/applications/20120038021/description.html
  • Application Number:  20120038021
  • Publication Date:  2012-02-16
  • Inventors:  Lin, Chung-Hsien; Chen, Meng-Wei; Lee, Chi-Chuang
    • Methods and apparatuses for alignment are disclosed. An exemplary method includes providing a substrate having a device region and an alignment region; forming a first material layer over the substrate; forming a device feature and a dummy feature in the first material layer, wherein the device feature is formed in the device region and the dummy feature is formed in the alignment region; forming a second material layer over the first material layer; and forming an alignment feature in the ...
    ]]>     20120038021     <![CDATA[DYE-CONTAINING NEGATIVE CURABLE COMPOSITION, COLOR FILTER AND METHOD FOR PRODUCING THE SAME]]> http://www.patentstorm.us/applications/20120037860/description.html
  • Application Number:  20120037860
  • Publication Date:  2012-02-16
  • Inventors:  Sasaki, Tomoya; Fujimori, Toru
    • The present invention provides a dye-containing negative curable composition comprising at least two dyes (A), an oxime photopolymerization initiator (B) and a radical polymerizable monomer (C); or a dye-containing negative curable composition comprising at east two organic-solvent soluble dyes (A), an oxime photopolymerization initiator (B), a radical polymerizable monomer (C) and an organic solvent (D), wherein the moisture content of the composition is less than 1% by mass relative to the ...
    ]]>     20120037860     <![CDATA[Double Patterning Strategy for Contact Hole and Trench in Photolithography]]> http://www.patentstorm.us/applications/20120034778/description.html
  • Application Number:  20120034778
  • Publication Date:  2012-02-09
  • Inventors:  Chen, Jian-Hong; Hsu, Feng-Cheng
    • A method of lithography patterning includes forming a first resist pattern on a substrate, the first resist pattern including a plurality of openings therein on the substrate; forming a second resist pattern on the substrate and within the plurality of openings of the first resist pattern, the second resist pattern including at least one opening therein on the substrate; and removing the first resist pattern to uncover the substrate underlying the first resist ...
    ]]>     20120034778     <![CDATA[MICRO-CHANNEL DEVICE AND METHOD FOR FABRICATING MICRO-CHANNEL DEVICE]]> http://www.patentstorm.us/applications/20120034566/description.html
  • Application Number:  20120034566
  • Publication Date:  2012-02-09
  • Inventors:  Kobayashi, Hiroshi; Tamura, Hiroshi; Wada, Hiroo; Kiyomoto, Tomofumi; Hong, Seokhyoung
    • A micro-channel device provided in a solution analysis system using pressure liquid feed comprises a plurality of straight-line channels and curved channels connecting the ends of the neighboring straight-line channels. The width w of each curved channel is smaller than the width t of each straight-line channel. The radius of curvature r of each curved channel is set so that the value of a expressed by formula (1) is equal to or smaller than the value of a at a local maximum point of the ...
    ]]>     20120034566     <![CDATA[Lithographic printing plate precursor]]> http://www.patentstorm.us/applications/20120034565/description.html
  • Application Number:  20120034565
  • Publication Date:  2012-02-09
  • Inventors:  Callant, Paul; Loccufier, Johan; Van Severen, Ineke; Lenaerts, Jens
    • A lithographic printing plate precursor comprising a coating provided on a support having a hydrophilic surface, the coating containing thermoplastic polymer particles and an infrared radiation absorbing dye characterized in that the coating further comprises a phenolic ...
    ]]>     20120034565     <![CDATA[POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD]]> http://www.patentstorm.us/applications/20120034564/description.html
  • Application Number:  20120034564
  • Publication Date:  2012-02-09
  • Inventors:  FUKUHARA, Toshiaki; KANDA, Hiromi; KANNA, Shinichi
    • A positive photosensitive composition includes:
      • (A) a resin that has an acid decomposable repeating unit of formula (I) and increases its solubility in an alkali developer by action of an acid;
      • (B) a compound that generates an acid upon irradiation;
      • (C) a ...
        ]]> 20120034564 <![CDATA[RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN]]> http://www.patentstorm.us/applications/20120034563/description.html
      • Application Number:  20120034563
      • Publication Date:  2012-02-09
      • Inventors:  ICHIKAWA, Koji; Yamamoto, Satoshi
      A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator represented by the formula (B1).

      wherein R1 represents a hydrogen atom or a methyl group; A10 represents a single bond, an optionally substituted C1 to C6 alkanediyl group or the like; W1 represents an optionally substituted C4 ...
      ]]> 20120034563 <![CDATA[COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST]]> http://www.patentstorm.us/applications/20120034562/description.html

    • Application Number:  20120034562
    • Publication Date:  2012-02-09
    • Inventors:  Coley, Suzanne; Wayton, Gerald B.; Trefonas, III, Peter; Kurihara, Tomoki
    In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated ...
    ]]>     20120034562     <![CDATA[RESIST POLYMER AND RESIST COMPOSITION]]> http://www.patentstorm.us/applications/20120034561/description.html
  • Application Number:  20120034561
  • Publication Date:  2012-02-09
  • Inventors:  Fujiwara, Tadayuki; Ootake, Atsushi; Iwai, Takeshi; Hayashi, Ryotaro; Momose, Hikaru; Ueda, Akifumi; Takeshita, Masaru
    • The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or ...
    ]]>     20120034561     <![CDATA[RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND POLYMER]]> http://www.patentstorm.us/applications/20120034560/description.html
  • Application Number:  20120034560
  • Publication Date:  2012-02-09
  • Inventors:  Nakashima, Hiromitsu; NAKAHARA, Kazuo; Kimura, Reiko
    • A radiation-sensitive resin composition includes (A) a polymer that includes a structural unit (I) including a group shown by the following formula (i), (B) a photoacid generator, and (C) a polymer that has a fluorine atom content lower than that of the polymer (A), and includes an acid-labile group. The polymer (A) preferably includes a structural unit shown by the following formula (1) as the structural unit (I). It is preferable that X in the formula (1) represent a divalent or trivalent ...
    ]]>     20120034560     <![CDATA[ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH]]> http://www.patentstorm.us/applications/20120034559/description.html
  • Application Number:  20120034559
  • Publication Date:  2012-02-09
  • Inventors:  TAKAHASHI, Toshiya; TAKAHASHI, Hidenori; TSUBAKI, Hideaki; TAMAOKI, Hiroshi
    • Provided is an actinic-ray- or radiation-sensitive resin composition, includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a repeating unit (B) with a structure that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and a compound (U) structured so that when the composition is formed into a film, the compound is unevenly distributed in a surface of the ...
    ]]>     20120034559     <![CDATA[PHOTOLITHOGRAPHY MATERIAL FOR IMMERSION LITHOGRAPHY PROCESSES]]> http://www.patentstorm.us/applications/20120034558/description.html
  • Application Number:  20120034558
  • Publication Date:  2012-02-09
  • Inventor:  Chang, Ching-Yu
    • A photolithography material is provided. The photolithography material is a surface modifying material. The photolithography material includes a polymer (e.g., fluorine polymer) that includes less than approximately 80% hydroxyl groups. In an embodiment, the photolithography material includes less than approximately 80% fluoro-alcohol functional units. Methods of using the photolithography material include as an additive to a photoresist or topcoat layer. The photolithography material may be ...
    ]]>     20120034558     <![CDATA[Method for preparing alignment mark for multiple patterning]]> http://www.patentstorm.us/applications/20120034557/description.html
  • Application Number:  20120034557
  • Publication Date:  2012-02-09
  • Inventor:  DUNN, Shannon W.
    • A method for image pattern recognition in a multi-image patterning scheme is described. The method includes forming a first feature pattern on a substrate using a lithographic process, and forming a second feature pattern on the substrate using the lithographic process. The method further includes forming an inspection alignment mark on the substrate to distinguish the first feature pattern from the second feature pattern. The inspection alignment mark comprises a negative tone pattern having a ...
    ]]>     20120034557     <![CDATA[ELECTROPHOTOGRAPHIC PHOTORECEPTOR, PROCESS FOR PRODUCING THE ELECTROPHOTOGRAPHIC PHOTORECEPTOR, AND ELECTROPHOTOGRAPHIC DEVICE]]> http://www.patentstorm.us/applications/20120034556/description.html
  • Application Number:  20120034556
  • Publication Date:  2012-02-09
  • Inventors:  Suzuki, Shinjiro; Nebashi, Kazuki; Takaki, Ikuo; Nakamura, Yoichi; Kitagawa, Seizo
    • An electrophotographic photoreceptor includes an electroconductive substrate; an undercoat layer provided on the electroconductive substrate and composed of: metal oxide fine particles including particles of at least one metal oxide and at least one organic compound provided on the particles of the at least one metal oxide as a surface treatment; and a copolymer resin synthesized by copolymerization of essential constituent monomers composed of a dicarboxylic acid, a diol, a triol and a ...
    ]]>     20120034556     <![CDATA[ANTI-STATIC AND SLIPPERY ANTI-CURL BACK COATING]]> http://www.patentstorm.us/applications/20120034555/description.html
  • Application Number:  20120034555
  • Publication Date:  2012-02-09
  • Inventors:  Grabowski, Edward F.; Yu, Robert C. U.; Tong, Yuhua
    • The presently disclosed embodiments relate generally to the formulation of an anticurl back coating layer that renders imaging apparatus flexible members and components their desirable flatness, for use in electrostatographic, including digital apparatuses. More particularly, the embodiments pertain to an imaging member comprising an anticurl back coating layer formulated to comprise a polymer blend of an anti-static polymer and a low surface energy A-B diblock copolymer polymer and an adhesion ...
    ]]>     20120034555     <![CDATA[Method for Fracturing and Forming a Pattern Using Circular Characters with Charged Particle Beam Lithography]]> http://www.patentstorm.us/applications/20120034554/description.html
  • Application Number:  20120034554
  • Publication Date:  2012-02-09
  • Inventors:  Tucker, Michael; Fujimura, Akira
    • In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a plurality of shots of circular or nearly-circular character projection characters, having at least two shots that overlap, can form a non-circular pattern on a surface. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming non-circular patterns ...
    ]]>     20120034554     <![CDATA[Photomask Blank, Photomask, and Pattern Transfer Method Using Photomask]]> http://www.patentstorm.us/applications/20120034553/description.html
  • Application Number:  20120034553
  • Publication Date:  2012-02-09
  • Inventors:  Kureishi, Mitsuhiro; Mitsui, Hideaki
    • A low reflective photomask blank suitable for shortened exposure wavelengths is disclosed. A photomask blank (1) having a single-layer or multilayer light-shielding film (3) arranged on a translucent substrate (2) and mainly containing a metal is characterized by comprising an antireflective film (6), which at least contains silicon and oxygen and/or nitrogen, on the light-shielding film ...
    ]]>     20120034553     <![CDATA[METHOD OF MANUFACTURING A PHOTOMASK]]> http://www.patentstorm.us/applications/20120034552/description.html
  • Application Number:  20120034552
  • Publication Date:  2012-02-09
  • Inventors:  Suzuki, Toshiyuki; Okubo, Yasushi; Hashimoto, Masahiro
    • A thin film composed of a material containing a metal and silicon is formed on a transparent substrate, and a thin film pattern is formed by patterning the thin film. Then, the main surface and the side walls of the thin film pattern are previously modified so as to prevent the transfer characteristics of the thin film pattern from changing more than predetermined even in the case where exposure light with a wavelength of 200 nm or less is cumulatively applied onto the thin film pattern which ...
    ]]>     20120034552     <![CDATA[BINARY PHOTOMASK BLANK AND BINARY PHOTOMASK MAKING METHOD]]> http://www.patentstorm.us/applications/20120034551/description.html
  • Application Number:  20120034551
  • Publication Date:  2012-02-09
  • Inventors:  Nishikawa, Kazuhiro; Kaneko, Hideo; Inazuki, Yukio; Yoshikawa, Hiroki
    • A binary photomask blank has on a transparent substrate a light-shielding film including substrate-side and surface-side compositionally graded layers, having a thickness of 35-60 nm, and composed of a silicon base material containing a transition metal and N and/or O. The substrate-side compositionally graded layer has a thickness of 10-58.5 nm, and a N+O content of 25-40 at % at its lower surface and 10-23 at % at its upper surface. The surface-side compositionally graded layer has a ...
    ]]>     20120034551     <![CDATA[METHODS OF PRODUCING STRUCTURES USING A DEVELOPER-SOLUBLE LAYER WITH MULTILAYER TECHNOLOGY]]> http://www.patentstorm.us/applications/20120034419/description.html
  • Application Number:  20120034419
  • Publication Date:  2012-02-09
  • Inventors:  Lamb, III, James E.; Washburn, Carlton Ashley; Smith, Brian A.; Furse, Justin Lee; Wang, Heping; Wang, Kang Le
    • Methods of forming microelectronic structures using multilayer processes are disclosed. The methods comprise the use of a developer-soluble protective layer adjacent the substrate surface in a multilayer stack to protect the substrate during pattern transfer. After etching, the pattern is transferred into the developer-soluble protective layer using a developer instead of etching required by previous methods. Conventional developer-soluble anti-reflective coatings and gap-fill materials can be ...
    ]]>     20120034419     <![CDATA[PROJECTED CAPACITIVE TOUCH PANEL AND FABRICATION METHOD THEREOF]]> http://www.patentstorm.us/applications/20120032898/description.html
  • Application Number:  20120032898
  • Publication Date:  2012-02-09
  • Inventors:  Li, Chi-Chen; Huang, Fu-Cheng
    • A projected capacitive touch panel and fabrication method thereof is provided. The method includes steps of: (a) providing a substrate; (b) forming a conductive layer on the first plane of the substrate, wherein the conductive layer has a first pattern and a second pattern; and (c) forming a conductive bridge on the conductive layer to electrically connect the first pattern with the second ...
    ]]>     20120032898     <![CDATA[SELF-ALIGNED PERMANENT ON-CHIP INTERCONNECT STRUCTURE FORMED BY PITCH SPLITTING]]> http://www.patentstorm.us/applications/20120032336/description.html
  • Application Number:  20120032336
  • Publication Date:  2012-02-09
  • Inventor:  Lin, Qinghuang
    • A method of fabricating an interconnect structure is provided. The method includes forming a hybrid photo-patternable dielectric material atop a substrate. The hybrid photo-patternable dielectric material has dual-tone properties with a parabola like dissolution response to radiation. The hybrid photo-patternable dielectric material is then image-wise exposed to radiation such that a self-aligned pitch split pattern forms. A portion of the self-aligned split pattern is removed to provide a ...
    ]]>     20120032336     <![CDATA[Sacrificial Polymer Compositions Including Polycarbonates Having Repeat Units Derived from Stereospecific Polycyclic 2,3-Diol Monomers]]> http://www.patentstorm.us/applications/20120031556/description.html
  • Application Number:  20120031556
  • Publication Date:  2012-02-09
  • Inventors:  Langsdorf, Leah; Shick, Robert A.; Seto, Keitaro; Bell, Andrew; Tsang, W. C. Peter
    • Embodiments according to the present invention relate to sacrificial polymer compositions that include polycarbonate polymers having repeat units derived from stereospecific polycyclic 2,3-diol monomers. The sacrificial polymer compositions also include an acid generator that is selected from at least one photoacid generator and/or at least one thermal acid generator. In addition, embodiments according to the present invention relate to a method of forming a structure that includes a ...
    ]]>     20120031556     <![CDATA[DEVICE FOR RAPID IDENTIFICATION OF NUCLEIC ACIDS FOR BINDING TO SPECIFIC CHEMICAL TARGETS]]> http://www.patentstorm.us/applications/20120028811/description.html
  • Application Number:  20120028811
  • Publication Date:  2012-02-02
  • Inventors:  Lis, John T.; Craighead, Harold G.; Kim, So Youn; Park, Seungmin; Ahn, Jiyoung; Jo, Minjoung
    • The present invention relates to microfluidic chips and their use in SELEX. The microfluidic chip preferably includes a reaction chamber that contains a high surface area material that contains target. One preferred high surface area material is a sol-gel derived material. Methods of making the microfluidic chips are described herein, as are uses of these devices to select aptamers against the ...
    ]]>     20120028811     <![CDATA[UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD]]> http://www.patentstorm.us/applications/20120028198/description.html
  • Application Number:  20120028198
  • Publication Date:  2012-02-02
  • Inventors:  NAKAMURA, Atsushi; Tsuji, Takayuki; Nakashima, Hiromitsu; Kouno, Daita; Dougauchi, Hiroshi; Nishimura, Yukio; Nakagawa, Hiroki
    • An upper layer-forming composition includes a resin, and a solvent. The resin is dissolvable in a developer for a photoresist film which is to be covered by the upper layer-forming composition to form a pattern by exposure to radiation. The solvent dissolves the resin in the solvent. The solvent includes a compound shown by a formula (1). Each of R1 and R2 independently represents a hydrocarbon group having 1 to 8 carbon atoms or a halogenated hydrocarbon group.

    ]]> 20120028198 <![CDATA[TRANSMISSION OPTICAL SYSTEM, ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD]]> http://www.patentstorm.us/applications/20120028197/description.html

  • Application Number:  20120028197
  • Publication Date:  2012-02-02
  • Inventor:  KITA, Naonori
    • According to one embodiment, a transmission optical system which guides light in a nearly parallel beam state emitted from an optical outlet port of a light source, to an optical inlet port of an exposure apparatus body and which injects the light in the nearly parallel beam state into the optical inlet port is provided with a condensing optical system which keeps the optical outlet port and the optical inlet port in an optical Fourier transform relation, and an angle distribution providing ...
    ]]>     20120028197     <![CDATA[METHOD OF FORMING PATTERN AND ORGANIC PROCESSING LIQUID FOR USE IN THE METHOD]]> http://www.patentstorm.us/applications/20120028196/description.html
  • Application Number:  20120028196
  • Publication Date:  2012-02-02
  • Inventors:  KAMIMURA, Sou; IWATO, Kaoru; KATAOKA, Shohei; ENOMOTO, Yuichiro; KATO, Keita; SAITOH, Shoichi
    • An embodiment of the method of forming a pattern, comprises (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) processing the exposed film with an organic processing liquid, wherein the processing liquid contains an organic solvent whose normal boiling point is 175° C. or higher, the organic solvent being contained in the processing liquid in a content of less than 30 mass ...
    ]]>     20120028196     <![CDATA[Composition for Coating over a Photoresist Pattern]]> http://www.patentstorm.us/applications/20120028195/description.html
  • Application Number:  20120028195
  • Publication Date:  2012-02-02
  • Inventors:  Yin, Jian; Cao, Yi; Wu, Hengpeng; Lee, DongKwan; Li, Meng; Hong, SungEun; Paunescu, Margareta
    • The present invention relates to an aqueous composition for coating over a photoresist pattern comprising a first water soluble compound comprising at least a silicon moiety and at least one amino group, and a second compound comprising at least 1 carboxylic acid group. The invention further relates to processes for using the novel ...
    ]]>     20120028195     <![CDATA[PATTERN FORMATION METHOD USING LEVENSON-TYPE MASK AND METHOD OF MANUFACTURING LEVENSON-TYPE MASK]]> http://www.patentstorm.us/applications/20120028194/description.html
  • Application Number:  20120028194
  • Publication Date:  2012-02-02
  • Inventors:  MONIWA, Akemi; OKUNO, Mitsuru
    • A method of forming a pattern including a first pattern portion having a first minimum dimension and a second pattern portion having a second minimum dimension includes a first exposure step of performing exposure using a Levenson-type mask and a second exposure step of performing exposure using a half tone-type mask. When second minimum dimension is 1.3 time or more than the first minimum dimension, the exposure amount of the second exposure step is set to be equal to or smaller than the ...
    ]]>     20120028194