Stereolithographic apparatus

Patent 7785093 Issued on August 31, 2010. Estimated Expiration Date:

May 21, 2028. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Abstract Claims Description Full Text

Patent References

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3896904

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Inventors

Assignee

3D Systems, Inc.

Application

No. 12124591 filed on 05/21/2008

US Classes:

425/185Means permitting removal or substitution of elements during apparatus operation

Examiners

Primary: Ewald, Maria Veronica D

Attorney, Agent or Firm

Foreign Patent References

EPX 1316408 DE 12/01/2002
0376571 EP 07/01/1990
1645402 EP 04/01/2006
1707341 EP 10/01/2006
2315699 GB 02/01/1993
55146015 JP 11/01/1980
6226864 JP 08/01/1994
3441203 JP 06/01/1996
8156105 JP 06/01/1996
8338753 JP 12/01/1996
2912721 JP 06/01/1999
11342541 JP 12/01/1999
3140741 JP 12/01/2000
WO 9325377 WO 12/01/1993
WO 0114125 WO 03/01/2001
WO 0226420 WO 04/01/2002
WO 0226478 WO 04/01/2002
WO 2004/014636 WO 02/01/2004

International Classes

B28B 17/00
B28B 1/14
B29B 13/08

Abstract

An improved stereolithography apparatus for forming three-dimensional objects using multiple chambered resin vats and a quick disconnect mounting system to permit concurrent use of multiple photopolymer build materials and easy change over of resin vats is disclosed. The apparatus permits easy change over from multiple chambered vat use to single chamber vat use and vice versa or change over between multiple chambered vats.