U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Parallax barrier, multiple display device and parallax barrier manufacturing method

Patent 7612834 Issued on November 3, 2009. Estimated Expiration Date: Icon_subject June 26, 2026. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Three-dimensional image display device
Patent #: 6392690
Issued on: 05/21/2002
Inventor: Fujii, et al.

Image displaying unit of a 3D image system having multi-viewpoints capable of displaying 2D and 3D images selectively Patent #: 7336326
Issued on: 02/26/2008
Inventor: Kim, et al.

Inventors

Assignee

Application

No. 11995146 filed on 06/26/2006

US Classes:

349/15Stereoscopic

Examiners

Primary: Qi, Mike

Attorney, Agent or Firm

Foreign Patent References

  • 2 405 516 GB 03/01/2005
  • 2 405 517 GB 03/01/2005
  • 2 405 518 GB 03/01/2005
  • 2 405 542 GB 03/01/2005
  • 2 405 545 GB 03/01/2005
  • 2 405 546 GB 03/01/2005
  • 2 406 731 GB 04/01/2005
  • 8-36145 JP 02/01/1996
  • 2005-78094 JP 03/01/2005
  • 2005/071474 WO 08/01/2005

International Classes

G02F 1/1335
G02F 1/1333

Abstract

A parallax barrier is manufactured by forming a light-blocking layer by patterning a metal layer or a resin layer on a barrier glass in a photolithography step. On a mask used in the photolithography step, some pitches between slits are different, the slits corresponding to portions whereupon the light-blocking layers are to be formed. In addition, on the mask, first pitches (for instance, 100) and second pitches (for instance 99.5), which can be actually formed with accuracy, are formed in a cycle, and the average of such pitches can be accord with a theoretical pitch distance (for instance, 99.99). Thus, in the parallax barrier to be used for a multiple display device, visibility of the entire screen can be improved, and the parallax barrier which can be manufactured by using the mask lithography technology having a limited accuracy, and a method for manufacturing such parallax barrier are provided.

Other References

  • Official communication issued in the International Application No. PCT/JP2006/312722; mailed on Jul. 25, 2006.
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