High repetition rate laser produced plasma EUV light source
Patent 7361918 Issued on April 22, 2008. Estimated Expiration Date: June 20, 2026. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
250/504R, Ultraviolet or infrared source250/493.1, RADIANT ENERGY GENERATION AND SOURCES60/202, Ion motor425/467, Core, pin or insert member75/246, Base metal one or more of Iron group, Copper(Cu), or Noble metal378/119, SOURCE378/34, Lithography431/71, Igniter cut off when flame establishment proved378/122, Field emisssion or cold cathode324/674, By frequency signal response, change or processing circuit430/311, Making electrical device315/326, DISCHARGE DEVICE LOAD307/419, Magnetic pulse generator372/37, HAVING AN APPLIED MAGNETIC FIELD204/192.15, Specified deposition material or use219/121.57, Arc ignition355/30, With temperature or foreign particle control372/38.07, Controlling current or voltage to laser372/55, Gas250/492.2, Irradiation of semiconductor devices372/57, Excimer or exciplex336/57, With inductor insulating fluid circulating means313/231.31, Plasma372/25Control of pulse characteristics
An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap.
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