Patent ReferencesReal world modeling and control process System for preparing production process flow Method for using data regarding manufacturing procedures integrated circuits (IC's) have undergone, such as repairs, to select procedures the IC's will undergo, such as additional repairs Automatic recipe adjust and download based on process control window Semiconductor product manufacturing execution system and semiconductor product manufacturing method Process flow preparation system and method System for and method of preparing manufacturing process specifications and production control system Method of using data regarding manufacturing procedures integrated circuits (IC's) have undergone, such as repairs, to select procedures the IC's will undergo, such as additional repairs Run-to-run controller for use in microelectronic fabrication Automated process monitoring and analysis system for semiconductor processing InventorsAssigneeApplicationNo. 11192691 filed on 07/29/2005US Classes:700/108, Performance monitoring700/103, Constraints or rules700/97, Design or planning700/121, Integrated circuit production or semiconductor fabrication700/96, Integrated system (Computer Integrated Manufacturing (CIM)700/95, Product assembly or manufacturing702/1, MEASUREMENT SYSTEM IN A SPECIFIC ENVIRONMENT700/99, Resource allocation700/100, Job scheduling705/26, Electronic shopping (e.g., remote ordering)706/45, KNOWLEDGE PROCESSING SYSTEM700/112, Having particular work transport control between manufacturing stations356/237.5, On patterned or topographical surface (e.g., wafer, mask, circuit board)700/1GENERIC CONTROL SYSTEM, APPARATUS OR PROCESSExaminersPrimary: Von Buhr, Maria N.Attorney, Agent or FirmInternational ClassG06F 19/00AbstractA method, apparatus, and a system for determining a control thread based upon a process result are provided. At least one post-process parameter is received. The post parameter relates to a first workpiece upon which a plurality of processes have been performed by a plurality of processing tools. A combination of at least a portion of the plurality of processing tools is selected based upon the post-process parameter. | |