Metrology tool recipe validator using best known methods
February 15, 2026. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesMethod and apparatus for determining performance characteristics in lithographic tools Automatic recipe adjust and download based on process control window Method for characterizing a photorepeater Method for controlling photoresist removal processes Method of using critical dimension mapping to optimize speed performance of microprocessor produced using an integrated circuit manufacturing process Integrated critical dimension control for semiconductor device manufacturing Recipe editor for editing and creating process recipes with parameter-level semiconductor-manufacturing equipment Recipe management database system Method and structure to reduce the damage associated with programming electrical fuses Incorporation of critical dimension measurements as disturbances to lithography overlay run to run controller Inventors
AssigneeApplicationNo. 11307640 filed on 02/15/2006US Classes:702/155, Dimensional determination438/14, WITH MEASURING OR TESTING356/399, BY ALIGNMENT IN LATERAL DIRECTION700/121, Integrated circuit production or semiconductor fabrication356/124, LENS OR REFLECTIVE IMAGE FORMER TESTING438/16, Optical characteristic sensed250/310, Electron probe type700/97, Design or planning707/104.1, Application of database or data structure (e.g., distributed, multimedia, image)438/215, Having fuse or integral short700/109, Quality control356/237.5, On patterned or topographical surface (e.g., wafer, mask, circuit board)430/5, Radiation mask356/625, DIMENSION438/8, Chemical etching715/500, PRESENTATION PROCESSING OF DOCUMENT700/108, Performance monitoring430/30, INCLUDING CONTROL FEATURE RESPONSIVE TO A TEST OR MEASUREMENT700/180, Having operator interface feature700/96, Integrated system (Computer Integrated Manufacturing (CIM)700/213, Article handling250/559.19, Measuring dimensions716/4, Testing or evaluating451/6By optical sensorExaminersPrimary: Barlow, JohnAssistant: Le, Long V. Attorney, Agent or FirmForeign Patent References
International ClassesG01B 7/00G01R 31/26 AbstractA method of preparing recipes for operating a metrology tool, each recipe including a set of instructions for measuring dimensions in a microelectronic feature. A database includes a plurality of known instructions with best known methods for measuring different feature dimensions by creating a summary of a recipes used by the tool, and adding categorization attributes to identify the summary for retrieval from the database. There is provided a desired recipe having instructions for measuring desired dimensions, including a summary of parameters relating to tool function for the feature dimension to be measured. The method includes comparing the instructions in the desired recipe with the instructions in the database, identifying differences therebetween, modifying the desired recipe instructions to conform to the database instructions, verifying the desired recipe prior to using the modified desired recipe by the tool, and using the desired recipe to execute a feature measurement on the tool.Other References
Field of SearchDimensional determinationCALIBRATION OR CORRECTION SYSTEM TESTING SYSTEM MEASUREMENT SYSTEM Integrated circuit production or semiconductor fabrication Variable rate Performance monitoring DIMENSION Light scanning INCLUDING CONTROL RESPONSIVE TO SENSED CONDITION WITH MEASURING OR TESTING DESIGN OF SEMICONDUCTOR MASK |
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