Computerized micromeasuring system and method therefor
High resolution ellipsometric apparatus
Method for determining absolute reflectance of a material in the ultraviolet range
Method and apparatus for measuring reflectance in two wavelength bands to enable determination of thin film thickness
Integrated spectroscopic ellipsometer
Focused beam spectroscopic ellipsometry method and system
Combined interferometer/ellipsometer for measuring small spacings
Optical system and method for angle-dependent reflection or transmission measurement
ApplicationNo. 10652696 filed on 09/02/2003
US Classes:356/364, BY POLARIZED LIGHT EXAMINATION356/369, Of surface reflection250/372, Ultraviolet light responsive means356/73, PLURAL TEST356/445, OF LIGHT REFLECTION (E.G., GLASS)356/326Utilizing a spectrometer
ExaminersPrimary: Chondhury, Tarifur R.
Assistant: Akanbi, Isiaka O.
Attorney, Agent or Firm
International ClassG01J 4/00
AbstractDisclosed is a system comprising a stage with “X”, “Y” and “Z” translation and “X”, “Y” and optionally “Z” axes rotation capability, in combination with interrogation and monitoring means which act in functional combination to orient the surface of a sample so as to set an intended oblique approach of an electromagnetic beam with respect to a sample surface at a monitored location thereon.