Multi-pixel electron microbeam irradiator systems and methods for selectively irradiating predetermined locations
December 28, 2025. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesMethod for fabrication of patterned carbon nanotube films Image forming device using field emission electron source arrays X-ray generating mechanism using electron field emission cathode Device comprising carbon nanotube field emitter structure and process for forming device X-ray generating mechanism using electron field emission cathode Large-area individually addressable multi-beam x-ray system and method of forming same Patent #: 6876724 InventorsAssigneeApplicationNo. 11320515 filed on 12/28/2005US Classes:250/398, With target means313/309DISCHARGE DEVICES HAVING A MULTIPOINTED OR SERRATED EDGE ELECTRODEExaminersPrimary: Vanore, David A.Attorney, Agent or FirmInternational ClassG01K 1/08AbstractMulti-pixel electron microbeam irradiator systems and methods are provided with particular applicability for selectively irradiating predetermined cells or cell locations. A multi-pixel electron microbeam irradiator system can include a plurality of individually addressable electron field emitters sealed in a vacuum. The multi-pixel electron microbeam irradiator system can include an anode comprising one or more electron permeable portions corresponding to the plurality of electron field emitters. Further, the multi-pixel electron microbeam irradiator system can include a controller operable to individually control electron extraction from each of the electron field emitters for selectively irradiating predetermined locations such as cells or cell locations.Other References
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