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US Patent 7154091 - Method and system for ultrafast photoelectron microscope

US Patent Issued on December 26, 2006
Estimated Patent Expiration Date: Icon_subject April 1, 2025Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
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Abstract

An ultrafast system (and methods) for characterizing one or more samples. The system includes a stage assembly, which has a sample to be characterized. The system has a laser source that is capable of emitting an optical pulse of less than 1 ps in duration. The system has a cathode coupled to the laser source. In a specific embodiment, the cathode is capable of emitting an electron pulse less than 1 ps in duration. The system has an electron lens assembly adapted to focus the electron pulse onto the sample disposed on the stage. The system has a detector adapted to capture one or more electrons passing through the sample. The one or more electrons passing through the sample is representative of the structure of the sample. The detector provides a signal (e.g., data signal) associated with the one or more electrons passing through the sample that represents the structure of the sample. The system has a processor coupled to the detector. The processor is adapted to process the data signal associated with the one or more electrons passing through the sample to output information associated with the structure of the sample. The system has an output device coupled to the processor. The output device is adapted to output the information associated with the structure of the sample.

Other References

  • May et al., Noncontact High-Speed Waveform Measurements with the Picosecond Photoelectron Scanning Electron Microscope, IEEE Journal of Quantum Electronics, vol. 24, No. 2, Feb. 1988, pp. 234-239.
  • Lobastov, V.A. et al., “4D Ultrafast Electron Microscopy”; 16 page manuscript, unpublished (dated Mar. 22, 2005).
  • Ruan, C.-Y. et al., “Ultrafast Electron Crystallography of Interfacial Water”; Science 304:80-84 (Apr. 2, 2004).
  • Srinivasan, R. et al., “Ultrafast Electron Diffraction (UED): A New Development for the 4D Determination of Transient Molecular Sructures”; Helvetica Chimica Acta 86(6):1761-1838 (2003).
  • Vigliotti, F. et al., “Ultrafast Electron Crystallography of Surface Structural Dynamics with Atomic-Scale Resolution”; Angewandte Chem. Int. Ed. 1-5 (2004).
  • Zewail, A.H., “Diffraction, Crystallography and Microscopy Beyond Three Dimensions: Structural Dynamics in Space and Time”; Philosophical Transactions of the Royal Society A 364:315-329 (2005).

Inventors

Assignee

Application

No. 11097837 filed on 04/01/2005

US Classes:

250/311, Electron microscope type250/307, Methods324/751Using electron beam probe

Examiners

Primary: Berman, Jack I.

Attorney, Agent or Firm

US Patent References

3628012, 5270643, Pulsed laser photoemission electron-beam probe
Issued on: 12/14/1993
Inventor: Richardson, et al.
5811804Electron microscope with raman spectroscopy
Issued on: 09/22/1998
Inventor: Van Blitterswijk, et al.

International Classes

H01J 37/26
G01N 23/04

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