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Nonvolatile memory device using semiconductor nanocrystals and method of forming same

Patent 7045851 Issued on May 16, 2006. Estimated Expiration Date: Icon_subject June 20, 2023. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

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Inventors

Application

No. 10465797 filed on 06/20/2003

US Classes:

257/315, With floating gate electrode257/316, With additional contacted control electrode257/17, With particular barrier dimension438/257, Having additional gate electrode surrounded by dielectric (i.e., floating gate)365/151, Molecular or atomic257/261, Junction gate region free of direct electrical connection (e.g., floating junction gate memory cell structure)423/348, Elemental silicon257/317With irregularities on electrode to facilitate charging or discharging of floating electrode

Examiners

Primary: Prenty, Mark V.

Attorney, Agent or Firm

Foreign Patent References

  • 1 256 986 EP 11/01/2002
  • 2001-233674 JP 08/01/2001

International Class

H01L 29/788

Abstract

A floating gate for a field effect transistor (and method for forming the same and method of forming a uniform nanoparticle array), includes a plurality of discrete nanoparticles in which at least one of a size, spacing, and density of the nanoparticles is one of templated and defined by a self-assembled material.

Other References

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  • International Search Report dated Nov. 16, 2004.
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