Quotables
"The idea that cavalry will be replaced by these iron coaches is absurd. It is little short of treasonous."
Aide-de-camp to Field Marshal Haig ; At a tank demonstration, 1916
PatentStorm News
Make the Most of PatentStorm
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest patents by subscribing to an RSS feed.
Got questions? Ask a Patent Expert!
Registered users: Manage your profile, comments and alerts.
US Patent 7029597 - Anodized aluminum etching process and related apparatus
US Patent Issued on April 18, 2006
Estimated Patent Expiration Date:
July 5, 2021Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
Estimated Patent Expiration Date:
July 5, 2021Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.AbstractA process for selectively etching a surface of an anodized aluminum article. A preferred process includes: providing an aluminum sheet or web including first and second sides having anodized finishes; etching the first side to improve the adhesion capabilities of that side but not etching the second side so that the second side retains its anodized finish. The anodized aluminum may be colored before etching, thus the second side retains its color after etching. In a more preferred embodiment, sodium hydroxide or phosphoric acid is used to etch the anodized aluminum. Optionally, the etching of the second side is prevented by administering gas or liquid over the second side, masking the second side with a protective film, or shielding the second side with a shield. Further, the gas or liquid administered over the second side may be controlled to increase or decrease the rate of etching on the first side.Other References
| InventorsAssigneeApplicationNo. 09899591 filed on 07/05/2001US Classes:216/102, Metal is elemental aluminum, an alloy, or compound thereof205/214, Graining or roughening chemically or electrolytically205/220, Treating electrolytic or nonelectrolytic coating after it is formed205/223, Etching of coating216/103, Etchant contains acid362/341, Reflector148/272, Coating or treating a metal oxide with a specified composition134/3, Including acidic agent156/345.19, With mechanical mask or shield or shutter for shielding workpiece216/92, Projecting etchant against a moving substrate or controlling the angle or pattern projection of the etchant or controlling the angle or pattern of movement of the substrate430/323, Including etching substrate205/204, Sealing agent includes organic constituent355/100, With further developing processing205/50, PRODUCT PRODUCED BY ELECTROLYSIS INVOLVING ELECTROLYTIC MARKING, BATTERY ELECTRODE ACTIVE MATERIAL FORMING, ELECTROFORMING, OR ELECTROLYTIC COATING216/54, PATTERN OR DESIGN APPLIED BY TRANSFER430/278.1, Aluminum205/148, Agitating or moving electrolyte during coating257/787, ENCAPSULATED438/706Vapor phase etching (i.e., dry etching)Field of Search216/102, Metal is elemental aluminum, an alloy, or compound thereof216/90, Relative movement between the substrate and a confined pool of etchant216/91, Rotating, repeated dipping, or advancing movement of substrate216/92, Projecting etchant against a moving substrate or controlling the angle or pattern projection of the etchant or controlling the angle or pattern of movement of the substrate216/88, Using film of etchant between a stationary surface and a moving surface (e.g., chemical lapping, etc.)216/89, Etchant contains solid particle (e.g., abrasive for polishing, etc.)216/83, NONGASEOUS PHASE ETCHING OF SUBSTRATE216/100, Substrate contains elemental metal, alloy thereof, or metal compound216/101, Etching of a compound containing at least one oxygen atom and at least one metal atom216/103, Etchant contains acid216/11, FORMING OR TREATING AN ARTICLE WHOSE FINAL CONFIGURATION HAS A PROJECTION216/56, ETCHING TO PRODUCE POROUS OR PERFORATED ARTICLE205/214, Graining or roughening chemically or electrolytically205/221, Selected area205/677, With one or more phosphoric acids205/678, With sulfuric acid205/223, Etching of coating156/345.11, For liquid etchant156/345.21, Liquid etchant spray type156/345.19With mechanical mask or shield or shutter for shielding workpieceExaminersPrimary: Hassanzadeh, ParvizAssistant: Culbert, Roberts Attorney, Agent or FirmUS Patent References3622472, 3671333, 3776783, 3898095, 4013498, Etching apparatus for accurately making small holes in thick materialsIssued on: 03/22/1977 Inventor: Frantzen , et al.4124437, System for etching patterns of small openings on a continuous strip of metal Issued on: 11/07/1978 Inventor: Bond , et al.4138526, Process for producing good adherence between a metal and polysulphide material and articles produced thereby Issued on: 02/06/1979 Inventor: Borresen , et al.4215194, Method for forming three-dimensional objects from sheet metal Issued on: 07/29/1980 Inventor: Shepherd4235682, Sealing solution and process to prevent deposits forming during the sealing of anodized aluminum surfaces Issued on: 11/25/1980 Inventor: Schneeberger , et al.4338007, Apparatus and process for making lithographic printing plate with reinforced image Issued on: 07/06/1982 Inventor: Fromson , et al.4367122, Method for anodizing aluminum Issued on: 01/04/1983 Inventor: Bednarz4398994, Formation of packaging material Issued on: 08/16/1983 Inventor: Beckett4618405, Process for the electrochemical roughening of aluminum for use as printing plate supports, in an aqueous mixed electrolyte Issued on: 10/21/1986 Inventor: Mohr , et al.4624752, Surface pretreatment of aluminium and aluminium alloys prior to adhesive bonding, electroplating or painting Issued on: 11/25/1986 Inventor: Arrowsmith , et al.5367196, Molded plastic semiconductor package including an aluminum alloy heat spreader Issued on: 11/22/1994 Inventor: Mahulikar, et al.5945351Method for etching damaged zones on an edge of a semiconductor substrate, and etching system Issued on: 08/31/1999 Inventor: Mathuni Foreign Patent References
International ClassesB44C 1/22C03C 15/00 C03C 25/68 C23F 1/00 C25F 3/00 |
