U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Method, device, computer-readable storage medium and computer program element for the computer-aided monitoring of a process parameter of a manufacturing process of a physical object

Patent 7027943 Issued on April 11, 2006. Estimated Expiration Date: Icon_subject November 12, 2023. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Method and system for real-time statistical process monitoring
Patent #: 5586041
Issued on: 12/17/1996
Inventor: Mangrulkar

Watchdog system having data differentiating means for use in monitoring of semiconductor wafer testing line Patent #: 5726920
Issued on: 03/10/1998
Inventor: Chen, et al.

Inventors

Assignee

Application

No. 10712418 filed on 11/12/2003

US Classes:

702/81, Quality evaluation702/117, Of circuit702/182, Performance or efficiency evaluation700/110, Defect analysis or recognition700/121, Integrated circuit production or semiconductor fabrication700/24, Addressing702/108, TESTING SYSTEM378/34, Lithography438/14WITH MEASURING OR TESTING

Examiners

Primary: Hoff, Marc S.

Attorney, Agent or Firm

Foreign Patent References

  • 2 283 116 GB 04/01/1995

International Classes

G06F 19/00
G01N 37/00

Abstract

In the case of the method for the computer-aided monitoring of process parameters of a manufacturing process of a physical object, object data which identify the physical object are assigned to various hierarchical levels, object data of various hierarchical levels are grouped to form hierarchical object data records, limit values for at least one process parameter are stored and respectively assigned to a hierarchical object data record, process data of the at least one process parameter, measured during the manufacture of physical objects, are stored and the hierarchical object data records corresponding to the object data are determined for physical objects manufactured.

Other References

  • Copy of European Search Report dated Mar. 10, 2004 for European Patent Application No. 03026035.
  • C. Schneider et al., “Automated Photolithography Critical Dimension Controls In a Complex, Mixed Technology, Manufacturing Fab”, IBM Microelectronics, 2001 IEEE/SEMI Advanced Semiconductor Manufacturing Conference.
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