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US Patent 7007707 - Mass flow ratio system and method
US Patent Issued on March 7, 2006
Estimated Patent Expiration Date:
April 1, 2024Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
Estimated Patent Expiration Date:
April 1, 2024Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.AbstractA system for dividing a single mass flow, including an inlet adapted to receive the single mass flow and at least two flow lines connected to the inlet. Each flow line includes a flow meter and a valve. The system also includes a controller programmed to receive a desired ratio of flow through a user interface, receive signals indicative of measured flow from the flow meters, calculate an actual ratio of flow through the flow lines based upon the measured flows, and compare the actual ratio to the desired ratio. The controller is also programmed to calculate the desired flow through at least one of the flow lines if the actual ratio is unequal to the desired ratio, and provide a signal indicative of the desired flow to at least one of the valves.Other References
| InventorsAssigneeApplicationNo. 10816084 filed on 04/01/2004US Classes:137/9, For producing proportionate flow137/101.19, With electrical controller137/118.04, Flow rate responsive137/487.5, Electrically actuated valve137/883, Single inlet with multiple distinctly valved outlets118/715, GAS OR VAPOR DEPOSITION702/45Flow meteringField of Search137/101.19, With electrical controller137/9, For producing proportionate flow137/118.04, Flow rate responsive137/118.06, Pressure responsive137/486, Responsive to change in rate of fluid flow137/487.5, Electrically actuated valve137/883, Single inlet with multiple distinctly valved outlets700/282, Flow control (e.g., valve or pump control)700/285, Fluid mixing702/45Flow meteringExaminersPrimary: Krishnamurthy, RameshAttorney, Agent or FirmUS Patent References1767588, 1886575, 2288297, 2314152, 2638912, 2661756, 2780414, 3092127, 3438385, 3556126, 3762428, 4369031, Gas control system for chemical vapor deposition systemIssued on: 01/18/1983 Inventor: Goldman , et al.5031674, Fluid flow control method and apparatus for minimizing particle contamination Issued on: 07/16/1991 Inventor: Mack5165450, Means for separating a fluid stream into two separate streams Issued on: 11/24/1992 Inventor: Marrelli5240046, Fluid flow control method and apparatus for minimizing particle contamination Issued on: 08/31/1993 Inventor: Mack5307833, Method and apparatus for automatically transferring and measuring wet steam between priority and secondary users Issued on: 05/03/1994 Inventor: Stoy, et al.5449495, Nitrogen oxide removal control apparatus Issued on: 09/12/1995 Inventor: Goto5453124, Programmable multizone gas injector for single-wafer semiconductor processing equipment Issued on: 09/26/1995 Inventor: Moslehi, et al.5927321System for measuring and controlling gas mass flow Issued on: 07/27/1999 Inventor: Bergamini Foreign Patent References
International ClassesG05D 11/13G05D 7/06 |
