Method for producing large area antireflective microtextured surfaces
December 7, 2022. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesReducing the reflectance of surfaces to radiation Polymeric optical element having antireflecting surface Optical article and method Procedure for fabrication of microstructures over large areas using physical replication Method of fabricating surface relief holograms Anti-reflective glass surface Scale-up process for replicating large area diffractive optical elements Antireflection surface having a predetermined roughness, particularly for motor-vehicle dashboards Anti-reflective films and methods Anti-reflection layer in spatial light modulators InventorsApplicationNo. 10314031 filed on 12/07/2002US Classes:430/321, Optical device430/322, Forming nonplanar surface430/323, Including etching substrate359/290By changing physical characteristics (e.g., shape, size or contours) of an optical elementExaminersPrimary: McPherson, John A.Attorney, Agent or FirmInternational ClassG02B005/00AbstractA method employing a photolithography mask for producing microtextured antireflective surfaces is disclosed. The photolithography mask is used during the exposure of photoresist to a pattern of ultraviolet light. The exposed photoresist is subsequently processed to obtain a microtextured surface possessing antireflective properties. The antireflective surface profile comprises an array of sub-micron protuberances that may reside in a periodic arrangement, a quasiperiodic arrangement, or in an arbitrary non-periodic arrangement. The antireflective surface is designed for visible light. It may be scaled-up to large areas, and is suitable for replication into inexpensive polymer materials.Other References
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