Method and apparatus for a pellicle frame with heightened bonding surfaces
June 18, 2023. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesReticle transporter Reticle frame assembly High-efficiency metal membrane element, filter, and process for making Pellicle for protection of photolithographic mask Reticle container with corner holding Pellicle assembly having a vented frame X-ray mask and X-ray exposure method using the same X-ray mask pellicles and their attachment in semiconductor manufacturing SMIF container including a reticle support structure Method and apparatus for a reticle with purged pellicle-to-reticle gap Patent #: 6507390 InventorsAssigneeApplicationNo. 10464840 filed on 06/18/2003US Classes:355/75, Detailed holder for original355/53, Step and repeat355/72Detailed holder for photosensitive paperExaminersPrimary: Nguyen, Henry HungAttorney, Agent or FirmForeign Patent References
International ClassesG03B 2762G03B 2742 G03B 2758 G03F 114 AbstractA method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.Other References
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