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US Patent 6822731 - Method and apparatus for a pellicle frame with heightened bonding surfaces
US Patent Issued on November 23, 2004
Estimated Patent Expiration Date:
June 18, 2023Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
Estimated Patent Expiration Date:
June 18, 2023Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.AbstractA method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.Other References
| InventorsAssigneeApplicationNo. 10464840 filed on 06/18/2003US Classes:355/75, Detailed holder for original355/53, Step and repeat355/72Detailed holder for photosensitive paperField of Search355/53, Step and repeat310/310, Friction310/12, Linear318/649, Stable platforms378/34, Lithography378/35, Pattern mask430/5, Radiation mask430/20, LIQUID CRYSTAL PROCESS, COMPOSITION, OR PRODUCT430/30INCLUDING CONTROL FEATURE RESPONSIVE TO A TEST OR MEASUREMENTExaminersPrimary: Nguyen, Henry HungAttorney, Agent or FirmUS Patent References4719705, Reticle transporterIssued on: 01/19/1988 Inventor: Laganza , et al.4986007, Reticle frame assembly Issued on: 01/22/1991 Inventor: Laganza, et al.5487771, High-efficiency metal membrane element, filter, and process for making Issued on: 01/30/1996 Inventor: Zeller5691088, Pellicle for protection of photolithographic mask Issued on: 11/25/1997 Inventor: Kubota, et al.5727685, Reticle container with corner holding Issued on: 03/17/1998 Inventor: Laganza, et al.5814381, Pellicle assembly having a vented frame Issued on: 09/29/1998 Inventor: Kuo6101237, X-ray mask and X-ray exposure method using the same Issued on: 08/08/2000 Inventor: Miyachi, et al.6192100, X-ray mask pellicles and their attachment in semiconductor manufacturing Issued on: 02/20/2001 Inventor: Acosta, et al.6216873, SMIF container including a reticle support structure Issued on: 04/17/2001 Inventor: Fosnight, et al.6507390Method and apparatus for a reticle with purged pellicle-to-reticle gap Issued on: 01/14/2003 Inventor: Ivaldi Foreign Patent References
International ClassesG03B 2762G03B 2742 G03B 2758 G03F 114 |
