Optical system with compensated spatial dispersion

Patent 6816326 Issued on November 9, 2004. Estimated Expiration Date:

July 12, 2022. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Abstract Claims Description Full Text

Patent References

Polarization control system
Patent #: 5191387
Issued on: 03/02/1993
Inventor: Ichikawa, et al.

Double-refracting planar plate arrangement and deep ultraviolet λ/4-plate
Patent #: 6084708
Issued on: 07/04/2000
Inventor: Schuster

Birefringent plate arrangement with stress birefringence
Patent #: 6141148
Issued on: 10/31/2000
Inventor: Becker

Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement Patent #: 6191880
Issued on: 02/20/2001
Inventor: Schuster

Inventors

Assignee

Schott Glas

Application

No. 10194700 filed on 07/12/2002

US Classes:

359/822, Adjustable359/499Using compensation techniques

Examiners

Primary: Sugarman, Scott J.
Assistant: Raizen, Deborah

Attorney, Agent or Firm

Striker; Michael J.

Foreign Patent References

0 834 753 EP 04/01/1998
0 942 300 EP 09/01/1999
86 03601 WO 06/01/1986

International Classes

G02B 700
G02B 530

Abstract

The optical system has a first optical element (11,17, 19, 26) and a second optical element (12, 18, 20, 27) having respective plane surfaces and cubic crystal structures, which are arranged next to each other along an optic axis (10) so that one of the crystal axes of each optical element is parallel to the optic axis and the plane surfaces are resting against each other. The first and second optical elements have first and second orientations in relation to the optic axis, which are preferably rotated by a rotation about the optic axis (10) with respect to each other according to the rotational symmetry of the material. At least one of the first optical element and second optical element is pre-stressed by applying a compressive stress (σ,σ,1,σ2) thereto. The compressive stress is applied radially symmetrically in a plane perpendicular to the optic axis (10) and compensates for spatial dispersion.

Other References

Warren J. Smith, Modern Optical Engineering: the Design of Optical Systems, 2nd Ed., 1990, McGraw-Hill, pp. 76-77.*
Merriam-Webster's Collegiate Dictionary, Tenth Edition 2001, p. 557.*
Burnett et al., “Alternative Materials Development (LITJ216) Final Report—Stress Birefringence, Intrinsic Birefringence, and index Properties of 157 nm Refractive Materials,” Technology Transfer #02014243A-ENG; International SEMATECH; Feb. 28, 2002.*
Burnett J H et al: “Intrinsic Birefringence . . . ” Physical Review, B. Condensed Matter, Americal Institute of Physics, New York, US. BD. 64, NR. 24, Dec. 15, 2001, pp. 241102-1-241102-4.
C. Kittel: “Einfuehrung in Die Festkoerperphysik”, 4. Auflage, Oldenbourg, Muenchen, 1976PP 43-47.