Patent References 6083661 Interconnect line formed by dual damascene using dielectric layers having dissimilar etching characteristics Patent #: 6514671 InventorsApplicationNo. 10189551 filed on 07/08/2002US Classes:430/302, Lithographic430/138, MICROCAPSULE, PROCESS, COMPOSITION, OR PRODUCT430/270.1, Radiation sensitive composition or product or process of making430/281.1, Radiation sensitive composition comprising ethylenically unsaturated compound430/286.1, Resin or prepolymer containing ethylenical unsaturation430/309, Post imaging process430/401, POST IMAGING PROCESSING430/434, Developing430/494, INCLUDING EXPOSURE STEP OR SPECIFIED PRE-EXPOSURE STEP PERFECTING EXPOSURE430/944, INFRARED430/945, LASER BEAM101/463.1, Lithographic plate making, and processes of making or using copy elements, and elements per se101/465, Making plate surface portions ink repellent or ink receptive101/467By use of radiant energy or heatExaminersPrimary: Gilliam, BarbaraAttorney, Agent or FirmInternational ClassesG03F 7038G03F 726 AbstractA lithographic process comprises the steps of imagewise heating a presensitized lithographic printing plate and removing an unheated area of an image-forming layer to form a lithographic printing plate. The presensitized lithographic printing plate comprises a hydrophilic support and the image-forming layer. The image-forming layer contains a compound or a polymer having o-quinodimethane structures or precursor structures thereof. The lithographic printing plate is prepared by a reaction of the o-quinodimethane structures.Field of SearchLithographic plate making, and processes of making or using copy elements, and elements per seMaking plate surface portions ink repellent or ink receptive By use of radiant energy or heat MICROCAPSULE, PROCESS, COMPOSITION, OR PRODUCT Radiation sensitive composition or product or process of making Radiation sensitive composition comprising ethylenically unsaturated compound Resin or prepolymer containing ethylenical unsaturation Lithographic Relief Post imaging process THERMOGRAPHIC PROCESS POST IMAGING PROCESSING Developing INCLUDING EXPOSURE STEP OR SPECIFIED PRE-EXPOSURE STEP PERFECTING EXPOSURE INFRARED LASER BEAM |
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