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US Patent 6712084 - Apparatus and method for pressure fluctuation insensitive mass flow control
US Patent Issued on March 30, 2004
Estimated Patent Expiration Date:
June 24, 2022Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
Estimated Patent Expiration Date:
June 24, 2022Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.AbstractA mass flow controller includes a thermal mass flow sensor in combination with a pressure sensor to provide a mass flow controller that is relatively insensitive to fluctuations in input pressure. The pressure sensor and thermal sensor respectively provide signals to an electronic controller indicating the measured inlet flow rate and the pressure within the dead volume. The electronic controller employs the measured pressure to compensate the measured inlet flow rate and to thereby produce a compensated measure of the outlet flow rate, which may be used to operate a mass flow controller control valve. | InventorsApplicationNo. 10178721 filed on 06/24/2002US Classes:137/12, By fluid pressure137/486, Responsive to change in rate of fluid flow137/487.5, Electrically actuated valve137/599.13Including flowmeterField of Search137/12, By fluid pressure137/486, Responsive to change in rate of fluid flow137/487.5, Electrically actuated valve137/599.01, Dividing into parallel flow paths with recombining137/599.11, Flow passage with bypass137/599.13, Including flowmeter700/282, Flow control (e.g., valve or pump control)73/202, Proportional73/202.5Thermal sensing of flowExaminersPrimary: Rivell, JohnAssistant: Krishnamurthy, Ramesh Attorney, Agent or FirmUS Patent References4285245, Method and apparatus for measuring and controlling volumetric flow rate of gases in a lineIssued on: 08/25/1981 Inventor: Kennedy5062446, Intelligent mass flow controller Issued on: 11/05/1991 Inventor: Anderson5201581, Method and apparatus for measuring mass flow and energy content using a linear flow meter Issued on: 04/13/1993 Inventor: Vander Heyden, et al.5660207, Flow controller, parts of flow controller, and related method Issued on: 08/26/1997 Inventor: Mudd5684245, Apparatus for mass flow measurement of a gas Issued on: 11/04/1997 Inventor: Hinkle5765283, Method of making a flow controller Issued on: 06/16/1998 Inventor: Mudd5805442, Distributed interface architecture for programmable industrial control systems Issued on: 09/08/1998 Inventor: Crater, et al.5850850, Flow controller, parts of flow controller, and related method Issued on: 12/22/1998 Inventor: Mudd5911238, Thermal mass flowmeter and mass flow controller, flowmetering system and method Issued on: 06/15/1999 Inventor: Bump, et al.5925829, Method and apparatus for determining a rate of flow of gas by a rate of change of pressure Issued on: 07/20/1999 Inventor: Laragione, et al.5944048, Method and apparatus for detecting and controlling mass flow Issued on: 08/31/1999 Inventor: Bump, et al.5975126, Method and apparatus for detecting and controlling mass flow Issued on: 11/02/1999 Inventor: Bump, et al.6061603, System for remotely accessing an industrial control system over a commercial communications network Issued on: 05/09/2000 Inventor: Papadopoulos, et al.6151625, Internet web interface including programmable logic controller for controlling output devices based on status of input devices Issued on: 11/21/2000 Inventor: Swales, et al.6247495, Flow rate detection mechanism with a restriction element for mass flow meters Issued on: 06/19/2001 Inventor: Yamamoto, et al.6321272, Apparatus for controlling internetwork communications Issued on: 11/20/2001 Inventor: Swales6332348, Gas flow calibration of mass flow controllers Issued on: 12/25/2001 Inventor: Yelverton, et al.6333272, Gas distribution apparatus for semiconductor processing Issued on: 12/25/2001 Inventor: McMillin, et al.6343617, System and method of operation of a digital mass flow controller Issued on: 02/05/2002 Inventor: Tinsley, et al.6450200, Flow control of process gas in semiconductor manufacturing Issued on: 09/17/2002 Inventor: Ollivier6640140PLC executive with integrated web server Issued on: 10/28/2003 Inventor: Lindner , et al. Foreign Patent References
International ClassG05D 706 |
