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US Patent 6641986 - Acetylenic diol surfactant solutions and methods of using same
US Patent Issued on November 4, 2003
Estimated Patent Expiration Date:
August 12, 2022Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
Estimated Patent Expiration Date:
August 12, 2022Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.AbstractAqueous solutions comprising one or more acetylenic diol type surfactants are used to improve the wettability of a substrate surface by lowering the contact angle of the aqueous developer solution are enclosed herein. In one embodiment, the aqueous solution is used to prepare the surface of the substrate prior to development of the resist coating layer. | InventorsAssigneeApplicationNo. 10/218068 filed on 08/12/2002US Classes:430/325, Post image treatment to produce elevated pattern430/271.1, Identified backing or protective layer containing430/327, Processing feature prior to imaging430/331, Finishing or perfecting composition or product510/175, For printed or integrated electrical circuit, or semiconductor device510/176, For stripping photoresist material510/421, Polyoxyalkylene containing surfactant devoid of covalently bonded anionic substituents516/204, The agent contains organic compound containing oxygen (e.g., carboxylic acid ester)568/616, Carbon to carbon unsaturation containing568/855Acetylenically unsaturatedField of Search430/327, Processing feature prior to imaging430/329, Removal of imaged layers430/331, Finishing or perfecting composition or product430/325Post image treatment to produce elevated patternExaminersPrimary: Schilling, Richard L.Attorney, Agent or FirmUS Patent References4374920, Positive developer containing non-ionic surfactantsIssued on: 02/22/1983 Inventor: Wanat , et al.4833067, Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant Issued on: 05/23/1989 Inventor: Tanaka , et al.5064749, Dampening water composition for lithographic plate Issued on: 11/12/1991 Inventor: Matsumoto, et al.5098478, Water-based ink compositions Issued on: 03/24/1992 Inventor: Krishnan, et al.5650543, Ethoxylated acetylenic glycols having low dynamic surface tension Issued on: 07/22/1997 Inventor: Medina5756267, Developing solution for negative type photosensitive resin compositions Issued on: 05/26/1998 Inventor: Matsuda, et al.5977041, Aqueous rinsing composition Issued on: 11/02/1999 Inventor: Honda6261745, Post-ashing treating liquid compositions and a process for treatment therewith Issued on: 07/17/2001 Inventor: Tanabe, et al.6284718, Composition for topical use containing an acetylenic diol, and use thereof for cleansing or removing make-up from the skin, mucous membranes and the hair Issued on: 09/04/2001 Inventor: Simon6313182Acetylenic diol ethylene oxide/propylene oxide adducts and processes for their manufacture Issued on: 11/06/2001 Inventor: Lassila, et al. International ClassesB01F 17/00 (20060101)G03F 7/38 (20060101) G03F 7/16 (20060101) G03F 7/004 (20060101) |
