Acetylenic diol surfactant solutions and methods of using same

Patent 6641986 Issued on November 4, 2003. Estimated Expiration Date:

August 12, 2022. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Abstract Claims Description Full Text

Patent References

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Inventors

Assignee

Air Products and Chemicals, Inc.

Application

No. 10/218068 filed on 08/12/2002

US Classes:

430/325, Post image treatment to produce elevated pattern430/271.1, Identified backing or protective layer containing430/327, Processing feature prior to imaging430/331, Finishing or perfecting composition or product510/175, For printed or integrated electrical circuit, or semiconductor device510/176, For stripping photoresist material510/421, Polyoxyalkylene containing surfactant devoid of covalently bonded anionic substituents516/204, The agent contains organic compound containing oxygen (e.g., carboxylic acid ester)568/616, Carbon to carbon unsaturation containing568/855Acetylenically unsaturated

Examiners

Primary: Schilling, Richard L.

Attorney, Agent or Firm

Morris-Oskanian; Rosaleen P.

International Classes

B01F 17/00 (20060101)
G03F 7/38 (20060101)
G03F 7/16 (20060101)
G03F 7/004 (20060101)

Abstract

Aqueous solutions comprising one or more acetylenic diol type surfactants are used to improve the wettability of a substrate surface by lowering the contact angle of the aqueous developer solution are enclosed herein. In one embodiment, the aqueous solution is used to prepare the surface of the substrate prior to development of the resist coating layer.