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US Patent 6618134 - Sample inspection system
US Patent Issued on September 9, 2003
Estimated Patent Expiration Date:
December 27, 2021Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
Estimated Patent Expiration Date:
December 27, 2021Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.AbstractA curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.Other References
| InventorsApplicationNo. 10/033069 filed on 12/27/2001US Classes:356/237.4, On patterned or topographical surface (e.g., wafer, mask, circuit board)356/237.5On patterned or topographical surface (e.g., wafer, mask, circuit board)Field of Search356/394, With comparison to master, desired shape, or reference voltage356/237.1, INSPECTION OF FLAWS OR IMPURITIES356/237.2, Surface condition356/237.3, Detection of object or particle on surface356/237.4, On patterned or topographical surface (e.g., wafer, mask, circuit board)356/237.5, On patterned or topographical surface (e.g., wafer, mask, circuit board)356/369, Of surface reflection356/239.1, Transparent or translucent material356/239.2, Optical element (e.g., contact lens, prism, filter, lens, etc.)356/239.3Patterned surfaceExaminersPrimary: Pham, Hoa Q.Attorney, Agent or FirmUS Patent References4395126, Apparatus for reflectance measurement of fluorescent radiation and composite useful thereinIssued on: 07/26/1983 Inventor: Kramer4449818, Method of inspecting microscopic surface defects Issued on: 05/22/1984 Inventor: Yamaguchi , et al.4540286, Apparatus for continuously measuring the degree of milling of grains Issued on: 09/10/1985 Inventor: Satake , et al.4558949, Horizontal position detecting device Issued on: 12/17/1985 Inventor: Uehara , et al.4589773, Position detecting system Issued on: 05/20/1986 Inventor: Ido , et al.4598997, Apparatus and method for detecting defects and dust on a patterned surface Issued on: 07/08/1986 Inventor: Steigmeier , et al.4669875, Foreign particle detecting method and apparatus Issued on: 06/02/1987 Inventor: Shiba , et al.4794265, Surface pit detection system and method Issued on: 12/27/1988 Inventor: Quackenbos , et al.4861164, Apparatus for separating specular from diffuse radiation Issued on: 08/29/1989 Inventor: West4898471, Particle detection on patterned wafers and the like Issued on: 02/06/1990 Inventor: Vaught, et al.4929845, Method and apparatus for inspection of substrates Issued on: 05/29/1990 Inventor: Amir, et al.4966457, Inspecting apparatus for determining presence and location of foreign particles on reticles or pellicles Issued on: 10/30/1990 Inventor: Hayano, et al.5058982, Illumination system and inspection apparatus including same Issued on: 10/22/1991 Inventor: Katzir RE33956, 5125741, Method and apparatus for inspecting surface conditions Issued on: 06/30/1992 Inventor: Okada, et al.5155372, Optical inspection system utilizing wedge shaped spatial filter Issued on: 10/13/1992 Inventor: Bowen, et al.5189481, Particle detector for rough surfaces Issued on: 02/23/1993 Inventor: Jann, et al.5245403, Apparatus for detecting extraneous substances on a glass plate Issued on: 09/14/1993 Inventor: Kato, et al.5389794, Surface pit and mound detection and discrimination system and method Issued on: 02/14/1995 Inventor: Allen, et al.5416594, Surface scanner with thin film gauge Issued on: 05/16/1995 Inventor: Gross, et al.5424838, Microelectronics inspection system Issued on: 06/13/1995 Inventor: Siu5463459, Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process Issued on: 10/31/1995 Inventor: Morioka, et al.5465145, Semiconductor wafer inspection apparatus Issued on: 11/07/1995 Inventor: Nakashige, et al.5530550, Optical wafer positioning system Issued on: 06/25/1996 Inventor: Nikoonahad, et al.5650614, Optical scanning system utilizing an atomic force microscope and an optical microscope Issued on: 07/22/1997 Inventor: Yasutake, et al.5672885, Surface displacement detection and adjustment system Issued on: 09/30/1997 Inventor: Allen, et al.5712701, Surface inspection system and method of inspecting surface of workpiece Issued on: 01/27/1998 Inventor: Clementi, et al.5798829, Single laser bright field and dark field system for detecting anomalies of a sample Issued on: 08/25/1998 Inventor: Vaez-Iravani5929983, Optical apparatus for determining the height and tilt of a sample surface Issued on: 07/27/1999 Inventor: Lu5940175, Method and apparatus for surface inspection in a chamber Issued on: 08/17/1999 Inventor: Sun6084664, Method of and apparatus for inspecting reticle for defects Issued on: 07/04/2000 Inventor: Matsumoto, et al.6118525, Wafer inspection system for distinguishing pits and particles Issued on: 09/12/2000 Inventor: Fossey, et al.6201601Sample inspection system Issued on: 03/13/2001 Inventor: Vaez-Iravani, et al. International ClassesG01N 21/47 (20060101)G01N 21/95 (20060101) G01N 21/88 (20060101) |
