Ion generation chamber
Patent 6576909 Issued on June 10, 2003. Estimated Expiration Date: 
February 28, 2021. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
February 28, 2021. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesCharged beam irradiating apparatus having a cleaning means and a method of cleaning a charged beam irradiating apparatus Shield configuration for vacuum chamber Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses Patent #: 5633506 InventorsApplicationNo. 796194 filed on 02/28/2001US Classes:250/426, Arc type250/423R, ION GENERATION250/425, With sample vaporizing means250/492.21Ion bombardmentExaminersPrimary: Lee, John D.Assistant: Wells, Nikita Attorney, Agent or FirmInternational ClassH01J 037/36AbstractAn ion generator chamber, for an implantation apparatus, having its interior walls surfaces knurled or roughened so that any of the materials used in the chamber cannot deposit onto the interior wall surfaces in a size sufficiently large enough to adversely affect the operation of the chamber, if the deposits peel off the interior walls of the chamber. By limiting the size of any deposits on interior chamber walls, the invention extends the average life of the filaments used in the chamber as well as extending the average time between any necessary cleaning of the inner chamber walls thereby extending the operating life of the chamber. | |
