U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Gas barrier polyurethane resin

Patent 6569533 Issued on May 27, 2003. Estimated Expiration Date: Icon_subject July 19, 2020. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3352830

3879330

3889031

Coating composition and its use for the preparation of oxygen barrier coatings on plastic articles
Patent #: 4710413
Issued on: 12/01/1987
Inventor: Quack

Manufacture of polymeric products
Patent #: 4880592
Issued on: 11/14/1989
Inventor: Martini, et al.

Food package comprised of polymer with thermally responsive permeability
Patent #: 5254354
Issued on: 10/19/1993
Inventor: Stewart

Tubular casing with an organochlorine-free coating impermeable to oxygen and water vapor, a process for its production and its use
Patent #: 5405664
Issued on: 04/11/1995
Inventor: Sirinyan, et al.

Packaging materials having oxygen barrier quality
Patent #: 5518792
Issued on: 05/21/1996
Inventor: Masuda, et al.

Gas barrier resin composition and its film and process for producing the same
Patent #: 5700560
Issued on: 12/23/1997
Inventor: Kotani, et al.

Laminate, laminate film and shaped article comprising inorganic laminar compound
Patent #: 5766751
Issued on: 06/16/1998
Inventor: Kotani, et al.

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Inventors

Assignee

Application

No. 619639 filed on 07/19/2000

US Classes:

428/423.1, Of polyamidoester (polyurethane, polyisocyanate, polycarbamate, etc.)428/425.1, Next to cellulosic428/425.5, Next to silicon-containing (silicone, cement, etc.) layer428/425.8, Next to free metal428/425.9, Particulate metal or metal compound-containing524/442, Soil or inorganic silicon DNRM (other than silicon dioxide, glass, quartz, novaculite, or silicon dioxide type)524/591, Water DNRM524/839, Solid polymer or SICP derived from -N=C=X (X is chalcogen) containing reactant524/840, N=C=X reactant has ionic group attached thereto, e.g., carboxyl sulfonic, etc.528/44, FROM REACTANT HAVING AT LEAST ONE -N=C=X GROUP (WHEREIN X IS A CHALCOGEN ATOM) AS WELL AS PRECURSORS THEREOF, E.G., BLOCKED ISOCYANATE, ETC.528/85With reactant containing at least two -XH groups

Examiners

Primary: Sergent, Rabon

Attorney, Agent or Firm

Foreign Patent References

  • 0 906 944 EP. 04/23/1999
  • 49-41469 JP. 04/23/1974
  • 62-179935 JP. 08/23/1987
  • 1-252631 JP. 10/23/1989
  • 4-345841 JP. 12/23/1992

International Classes

B32B 027/06
B32B 027/10
B32B 027/12
B32B 027/40
C08L 075/04

Foreign Application Priority Data

1999-07-27 JP

Abstract

A polyurethane resin having a total concentration of the urethane group and the urea group of not less than 15% by weight is prepared by reacting a diisocyanate component (e.g., an aromatic diisocyanate) with a diol component (e.g., a C2-8alkylene glycol). The repeating unit of the polyurethane resin may contain a constitutive unit of an aromatic or alicyclic compound. The polyurethane resin may be shaped into a film for use as a gas barrier film. The film may be a gas barrier composite film composed of a base film layer and a resin layer at least comprising the polyurethane resin. The present invention provides a polyurethane resin excellent in gas barrier properties against water vapor, oxygen, aromatics, and others, and a film containing the same.

Other References

  • M. Salame et al., "Prediction of Gas Barrier Properties of High Polymers", Polymer Engineering and Science, vol. 26, No. 22, Dec. 1986
  • Database WPI, Week 9551, Derwent Publications Ltd., London, GB; AN 1995-401017, XP002175404 "Thermoplastic Polyurethane" & JP 07 278249 A (Sekisui Chem Ind), Oct. 24, 1995 *abstract*
  • Database WPI, Week 9635, Derwent Publications Ltd., London, GB; AN 1996-350251, XP002175405 "Gas Barrier Laminated Matter for Packing Material" & JP 08 165366 A (NIPPON SHOKUBAI), Jun. 25, 1996 *abstract
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