U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Thin film optical measurement system and method with calibrating ellipsometer

Patent 6515746 Issued on February 4, 2003. Estimated Expiration Date: Icon_subject May 3, 2022. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3824017

3926524

Measurement of thin films by polarized light
Patent #: 3985447
Issued on: 10/12/1976
Inventor: Aspnes

Rotating-compensator ellipsometer
Patent #: 4053232
Issued on: 10/11/1977
Inventor: Dill ,   et al.

Thickness measurement instrument with memory storage of multiple calibrations
Patent #: 4155009
Issued on: 05/15/1979
Inventor: Lieber ,   et al.

Interferometric measuring method
Patent #: 4298283
Issued on: 11/03/1981
Inventor: Makosch ,   et al.

Device for contact-free thickness or interval measurement
Patent #: 4309103
Issued on: 01/05/1982
Inventor: Bodlaj

Method and apparatus for studying surface properties
Patent #: 4332476
Issued on: 06/01/1982
Inventor: Stenberg ,   et al.

Cylindrical grating monochromator for synchrotron radiation
Patent #: 4492466
Issued on: 01/08/1985
Inventor: Aspnes

Polariscope
Patent #: 4523848
Issued on: 06/18/1985
Inventor: Gorman ,   et al.

More ...

Inventors

Application

No. 138984 filed on 05/03/2002

US Classes:

356/369, Of surface reflection356/630Thickness

Examiners

Primary: Pham, Hoa Q.

Attorney, Agent or Firm

Foreign Patent References

  • 0 396 409 EP. 11/22/1990
  • 0 503 874 EP. 09/22/1992
  • 0 652415 EP. 05/22/1995
  • 61-182507 JP. 08/22/1986
  • 1023126 JP. 01/22/1989
  • 5-71923 JP. 03/22/1993
  • 5-93611 JP. 04/22/1993
  • 5-133811 JP. 05/22/1993
  • 7-159131 JP. 06/22/1995
  • 8-210972 JP. 08/22/1996
  • 2608132 JP. 02/22/1997
  • WO 94/25823 WO. 11/22/1994
  • WO 96/12941 WO. 05/22/1996

International Class

G01J 004/00

Abstract

An optical measurement system for evaluating a reference sample that has at least a partially known composition. The optical measurement system includes a reference ellipsometer and at least one non-contact optical measurement device. The reference ellipsometer includes a light generator, an analyzer and a detector. The light generator generates a beam of quasi-monochromatic light having a known wavelength and a known polarization for interacting with the reference sample. The beam is directed at a non-normal angle of incidence relative to the reference sample to interact with the reference sample. The analyzer creates interference between the S and P polarized components in the light beam after the light beam has interacted with reference sample. The detector measures the intensity of the light beam after it has passed through the analyzer. A processor determines the polarization state of the light beam entering the analyzer from the intensity measured by the detector, and determines an optical property of the reference sample based upon the determined polarization state, the known wavelength of light from the light generator and the composition of the reference sample. The processor also operates the optical measurement device to measure an optical parameter of the reference sample. The processor calibrates the optical measurement device by comparing the measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

Other References

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