Patent ReferencesProjection optical system and exposure apparatus provided therewith Patent #: 5831770 InventorsAssigneeApplicationNo. 793566 filed on 02/27/2001US Classes:359/656, Microscope objective359/657, Having seven components359/658, Having six components359/740Between lens componentsExaminersPrimary: Epps, GeorgiaAssistant: Thompson, Timothy Attorney, Agent or FirmForeign Patent References
International ClassesG02B 021/02G02B 009/00 Foreign Application Priority Data2000-02-29 JPAbstractAn objective lens includes a first lens unit constructed with a plurality of single lenses, having a negative power as a whole, and a second lens unit constructed with a plurality of single lenses, arranged on the object side of the first lens unit. Each of the first and second lens units is provided with air spaces between positive and negative lenses of different media and has at least one pair of lenses designed to satisfy all the following conditions when the parfocal distance of the objective lens is denoted by L (mm), an air apace by d (mm), the radius of curvature of a lens surface with a positive power opposite to the air space by Rp, and the radius of curvature of a lens surface with a negative power opposite to the air space by Rn, and in addition to the pair of lenses, the second lens unit has at least one single positive biconvex lens and at least one single positive meniscus lens, and thereby it becomes possible to correct chromatic aberration and to favorably obtain resolution corresponding to a high numerical aperture and a wavelength used:0.01<dd/L<0.010.88<Rp/Rn<1.14. | |