Method and apparatus for a reticle with purged pellicle-to-reticle gap
Patent 6507390 Issued on January 14, 2003. Estimated Expiration Date: 
February 10, 2020. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
February 10, 2020. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesReticle transporter Reticle frame assembly Reticle container with corner holding Pellicle assembly having a vented frame SMIF container including a reticle support structure Patent #: 6216873 InventorAssigneeApplicationNo. 501180 filed on 02/10/2000US Classes:355/75, Detailed holder for original355/77, Methods428/14Peripheral enclosure or frameExaminersPrimary: Mathews, AlanAssistant: Kim, Peter B. Attorney, Agent or FirmInternational ClassesG03B 027/62G03B 027/32 A47G 001/12 AbstractA method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system is described. A porous frame between a reticle and a pellicle maintains the purged optical gap. A porous frame includes a first and a second opposing surface. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. A gas supply interface infuses a purge gas through the porous frame and into the gap.Other References
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