Sputtering alloy films using a crescent-shaped aperture
Patent 6402906 Issued on June 11, 2002. Estimated Expiration Date: October 19, 2020. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
A method and system for producing thin film alloy by a sputtering deposition process comprising using a crescent-shaped aperture interposed between the target and substrate of a sputtering deposition system.
Japanese Journel of Applied Physics; Part 1 Regular Papers, Short Notes & Review Papers; Oct. 2000; vol. 39, No. 10, pp. 5992-5994
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