Sputtering alloy films using a crescent-shaped aperture

Patent 6402906 Issued on June 11, 2002. Estimated Expiration Date:

October 19, 2020. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Abstract Claims Description Full Text

Patent References

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Inventors

Assignee

Delphi Technologies, Inc.

Application

No. 692293 filed on 10/19/2000

US Classes:

204/192.15, Specified deposition material or use204/192.12, Glow discharge sputter deposition (e.g., cathode sputtering, etc.)204/298.11, Specified mask, shield or shutter204/298.19, Planar magnetron204/298.2, Moving magnetic field or target204/298.23, Moving workpiece or target204/298.29Oscillatory movement

Examiners

Primary: McDonald, Rodney G.

Attorney, Agent or Firm

VanOphem; John A.

Foreign Patent References

141685 DE 05/25/1980
142568 DE 07/25/1980
0291968 JP. 12/25/1986

International Class

C23C 014/34

Abstract

A method and system for producing thin film alloy by a sputtering deposition process comprising using a crescent-shaped aperture interposed between the target and substrate of a sputtering deposition system.

Other References

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