Non-contact end effector
Patent 6322116 Issued on November 27, 2001. Estimated Expiration Date: 
July 23, 2019. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
July 23, 2019. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3523706 3539216 3627590 Tool for the contact-free support of discs Contactless air film lifting device Method and apparatus for microwave heat-treatment of a semiconductor water Plasma processor and method for IC fabrication Wafer handler Non-contact pick-up head Wafer handling system with bernoulli pick-up InventorAssigneeApplicationNo. 361037 filed on 07/23/1999US Classes:294/64.3, By positive fluid stream directed against article414/941Includes means for gripping waferExaminersPrimary: Kramer, Dean J.Attorney, Agent or FirmInternational ClassesB25J 015/06B65G 049/07 AbstractA device that supports a substrate in a non-containing manner so as to controllably move the substrate within a substrate processing system. The device includes an end effector carrying support pads each having a vertical gas outlet and a horizontal outlet communicating with a gas supply to form a plurality of vertical gas jets and a plurality of horizontal gas jets. The vertical gas jets impinge on a lower surface of the substrate to urge the substrate into a fixed vertical position with respect to the support pads and the horizontal gas jets impinge on the substrate edge to urge the substrate into a fixed horizontal position with respect to the pads.Other References
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