U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Broad spectrum ultraviolet inspection methods employing catadioptric imaging

Patent 6313467 Issued on November 6, 2001. Estimated Expiration Date: Icon_subject June 16, 2020. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3748015

Automatic photomask inspection system and apparatus
Patent #: 4247203
Issued on: 01/27/1981
Inventor: Levy ,   et al.

Monocentric optical systems
Patent #: 4331390
Issued on: 05/25/1982
Inventor: Shafer

Catadioptric telescopes
Patent #: 4342503
Issued on: 08/03/1982
Inventor: Shafer

X-Y Stage for a patterned wafer automatic inspection system
Patent #: 4556317
Issued on: 12/03/1985
Inventor: Sandland ,   et al.

Method and apparatus for automatic wafer inspection
Patent #: 4618938
Issued on: 10/21/1986
Inventor: Sandland ,   et al.

Optical relay system with magnification
Patent #: 4747678
Issued on: 05/31/1988
Inventor: Shafer ,   et al.

Intense laser irradiation using reflective optics
Patent #: 4749840
Issued on: 06/07/1988
Inventor: Piwczyk

Single mirror projection optical system
Patent #: 4779966
Issued on: 10/25/1988
Inventor: Friedman

Contact-free measuring apparatus having an F-theta-corrected, catadioptric objective and method for using the same
Patent #: 4792695
Issued on: 12/20/1988
Inventor: Blandford

More ...

Inventors

Application

No. 596540 filed on 06/16/2000

US Classes:

250/372, Ultraviolet light responsive means250/461.1With ultraviolet source

Examiners

Primary: Hannaher, Constantine
Assistant: Israel, Andrew

Attorney, Agent or Firm

Foreign Patent References

  • 0 204 071 EP. 12/13/1986
  • 0 405 051 EP. 01/13/1991
  • 0 628 806 EP. 12/13/1994
  • 0 736 789 EP. 10/13/1996
  • 2 158 675 GB. 11/13/1985
  • 85/00408 WO. 01/13/1985
  • 86/01096 WO. 02/13/1986
  • 86/02730 WO. 05/13/1986
  • 86/07148 WO. 12/13/1986

International Class

G01N 021/64

Abstract

An ultraviolet (UV) catadioptric imaging system, with broad spectrum correction of primary and residual, longitudinal and lateral, chromatic aberrations for wavelengths extending into the deep UV (as short as about 0.16 μm), comprises a focusing lens group with multiple lens elements that provide high levels of correction of both image aberrations and chromatic variation of aberrations over a selected wavelength band, a field lens group formed from lens elements with at least two different refractive materials, such as silica and a fluoride glass, and a catadioptric group including a concave reflective surface providing most of the focusing power of the system and a thick lens providing primary color correction in combination with the focusing lens group. The field lens group is located near the intermediate image provided by the focusing lens group and functions to correct the residual chromatic aberrations. The system is characterized by a high numerical aperture (typ. greater than 0.7) and a large flat field (with a size on the order of 0.5 mm). The broad band color correction allows a wide range of possible UV imaging applications at multiple wavelengths.

Other References

  • Offner, "Field Lenses and Secondary Axial Aberration," Applied Optics, Aug. 1969, vol. 8, No. 8, pp. 1735-173
PatentsPlus Images
Enhanced PDF formats
loading...
PatentsPlus: add to cart
PatentsPlus: add to cartSearch-enhanced full patent PDF image
$9.95more info
PatentsPlus: add to cart
PatentsPlus: add to cartIntelligent turbocharged patent PDFs with marked up images
$16.95more info
 
Sign InRegister
Username  
Password   
forgot password?