Method for coating insulating film and glass substrate for image display using the same
Patent 6277507 Issued on August 21, 2001. Estimated Expiration Date: 
June 21, 2019. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
June 21, 2019. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesNon-iridescent glass structures Patent #: 4187336 InventorsAssigneeApplicationNo. 336784 filed on 06/21/1999US Classes:428/702, O-containing428/215, Absolute thicknesses specified428/216, No layer or component greater than 5 mils thick428/426, Of quartz or glass428/428, Next to another silicon containing layer428/546, Having metal particles428/698Carbide-, nitride-, or sulfide-containing layerExaminersPrimary: Jones, DeborahAssistant: Miranda, Lymarie Attorney, Agent or FirmInternational ClassesB32B 009/00B32B 019/00 Foreign Application Priority Data1998-07-06 JPAbstractA process for inexpensively producing an insulating substrate suitable for use in image displays fabricated through a high-temperature production step, such as plasma displays and field emission displays (FED). A multilayered insulating film of one member selected from SiO2, a silicon oxynitride, and a silicon nitride is coated on a surface of a glass plate by reactive sputtering using one or more silicon targets in oxygen or/and nitrogen. The interface between layers in the multilayered insulating film functions to trap sodium ions thermally diffusing from the glass, whereby the amount of sodium ions which dissolve in the insulating film and reach the surface thereof is considerably reduced. | |
