Apparatus for combining oxygen and hydrogen
Filter dust ejector and check valve arrangement in exhaust system of internal combustion engine
Method for generating water for semiconductor production Patent #: 6093662
ApplicationNo. 225575 filed on 01/05/1999
US Classes:422/177, Including solid, extended surface, fluid contact reaction means; e.g., inert Raschig rings, particulate absorbent, particulate or monolithic catalyst, etc.422/171, Solid, extended surface, fluid contact type422/172And means downstream of a stage for injecting a reactant into waste gas for interreaction in subsequent stage
ExaminersPrimary: Tran, Hien
Attorney, Agent or Firm
Foreign Patent References
International ClassB01J 008/00
Foreign Application Priority Data1998-01-06 JP
AbstractAn apparatus for the treatment of exhaust gases containing hydrogen which permits always stable treatment with certainty of the exhaust gases from a semiconductor manufacturing line or the like irrespective of violent fluctuations in the flow rate of the exhaust gases, without having adverse effects on the operation of the semiconductor manufacturing line. The apparatus comprises: an ejector-type vacuum generator having a suction port connected to the discharge source of exhaust gases containing hydrogen and having a drive fluid supply port connected to an oxygen supply source, a hydrogen-oxygen reactor provided with a catalyst and connected to a drive fluid discharge port of the vacuum generator, and a drain reservoir connected to an outlet of the reactor for storing water discharged therefrom.
Field of SearchSolid, extended surface, fluid contact type
And means downstream of a stage for injecting a reactant into waste gas for interreaction in subsequent stage
For radioactive reactant or product
Including solid, extended surface, fluid contact reaction means; e.g., inert Raschig rings, particulate absorbent, particulate or monolithic catalyst, etc.