Plasma reactor apparatus and method
Hollow-anode glow discharge apparatus
Semiconductor device manufacturing apparatus Patent #: 5433813
ApplicationNo. 205800 filed on 12/04/1998
US Classes:156/345.44, Electrically coupled to a power supply or matching circuit118/723E, Having glow discharge electrodes (e.g., DC, AC, RF, etc.)118/723MA, with magnet (e.g., electron cyclotron resonance, etc.)204/298.06, Triode, tetrode, auxiliary electrode or biased workpiece204/298.08, Specified power supply or matching network204/298.34, Auxiliary electrode, bias means or specified power supply204/298.38, Microwave excitation315/111.21Plasma generating
ExaminersPrimary: Huff, Mark F.
Assistant: Chacko-Davis, Daborah
Attorney, Agent or Firm
International ClassesC23F 001/02
Foreign Application Priority Data1997-12-17 JP
AbstractA plasma processing apparatus is provided which does not require replacement of a band eliminator according to a frequency used, which is capable of performing chamber cleaning without replacing a resonance circuit, and which is capable of performing plasma cleaning of the inside of the chamber without using a bellows. The plasma processing apparatus includes a resonance circuit (band eliminator) for causing series resonance with a microwave circuit formed of at least a susceptor electrode and a processing chamber in order to trap plasma between a plasma excitation electrode and the susceptor electrode when the surface of a workpiece placed on the susceptor electrode is processed by plasma generated between the plasma excitation electrode and the susceptor electrode, which are provided inside the processing chamber; and for causing parallel resonance with the microwave circuit in order to diffuse plasma inside the processing chamber when performing plasma cleaning.
Field of SearchTriode, tetrode, auxiliary electrode or biased workpiece
Specified power supply or matching network
Auxiliary electrode, bias means or specified power supply
Having glow discharge electrodes (e.g., DC, AC, RF, etc.)
Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.)