Method and apparatus for vaporizing liquid precursors and system for using same
October 2, 2016. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesVaporizer system for ion source Chemical vapor deposition Apparatus for the evaporation of liquids Method for controlling evaporation for vapor deposition Evaporation system and method for gas jet deposition of thin film materials Liquid pump and vaporizer Apparatus and method for delivering reagents in vapor form to a CVD reactor, incorporating a cleaning subsystem Liquid vaporizer/feeder Chemical vapor deposition method for forming a deposited film with the use of a liquid raw material and apparatus suitable for practicing said method Method and apparatus for removing material from a target by use of a ring-shaped elliptical laser beam and depositing the material onto a substrate InventorsApplicationNo. 08/720710 filed on 10/02/1996US Classes:261/141, Heat producer118/708, CONDITION RESPONSIVE CONTROL118/712, WITH INDICATING, TESTING, INSPECTING, OR MEASURING MEANS118/726, Crucible or evaporator structure261/115, Liquid spray261/142, Electric heater392/396, In continuous flow line connected heater392/397, Pipe or tube forms flow path392/398, With internal heating element392/399Flash chamberExaminersPrimary: Bueker, RichardAttorney, Agent or FirmInternational ClassC23C 16/448 (20060101)AbstractA vaporizing apparatus for providing a vaporized liquid precursor to a process chamber in a vapor deposition process includes a microdroplet forming device for generating microdroplets from a liquid precursor and a heated housing defining a vaporization zone having a vapor flow path from the microdroplet forming device to the process chamber. The vaporization zone receives the microdroplets and a heated carrier gas. The heated carrier gas has a temperature so as to provide the primary source of heat for vaporizing the microdroplets. A method of vaporizing liquids for vapor deposition processes includes generating microdroplets and utilizing a heated carrier gas as the primary source of heat for vaporizing the microdroplets. A vapor deposition system carrying out the method includes a heated carrier gas and a heated housing defining a heated vaporization zone. The heated housing receives the heated carrier gas. An atomizer for generating microdroplets from a liquid source dispenses the microdroplets in the heated vaporization zone. The heated carrier gas has a temperature so as to provide the primary source of heat for vaporizing the microdroplets in the vaporization zone. The vaporized liquid precursor is then directed to the process chamber from the heated vaporization zone.Other References
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