U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Deposition of resistor materials directly on insulating substrates

Patent 6210592 Issued on April 3, 2001. Estimated Expiration Date: Icon_subject April 29, 2018. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3691007

3808576

Deposited layer type thermometric resistance structure
Patent #: 4028657
Issued on: 06/07/1977
Inventor: Reichelt

Circuit board material
Patent #: 4808967
Issued on: 02/28/1989
Inventor: Rice ,   et al.

Circuit board material and electroplating bath for the production thereof
Patent #: 4892776
Issued on: 01/09/1990
Inventor: Rice

Resistive metal layers and method for making same
Patent #: 5243320
Issued on: 09/07/1993
Inventor: Clouser, et al.

Method for producing a circuit board material employing an improved electroplating bath
Patent #: 5336391
Issued on: 08/09/1994
Inventor: Rice

Combustion chemical vapor deposition of films and coatings
Patent #: 5652021
Issued on: 07/29/1997
Inventor: Hunt, et al.

Chemical vapor deposition and powder formation using thermal spray with near supercritical and supercritical fluid solutions Patent #: 5997956
Issued on: 12/07/1999
Inventor: Hunt, et al.

Inventors

Assignee

Application

No. 069679 filed on 04/29/1998

US Classes:

216/16, Forming or treating resistive material216/20, Adhesive or autogenous bonding of self-sustaining preforms (e.g., prefabricated base, etc.)257/E21.004, Of resistor (EPO)338/308, Resistance element coated on base427/101Resistor for current control (excludes heating element)

Examiners

Primary: Gulakowski, Randy
Assistant: Ahmed, Samir

Attorney, Agent or Firm

Foreign Patent References

  • WO 86/07100 WO. 12/13/1986
  • WO 89/02212 WO. 03/13/1989
  • WO 95/03168 WO. 02/13/1995

International Classes

H01C 001/12
H01B 013/00

Abstract

Resistors are formed by selective etching from layered thin film material comprising an insulating substrate, a resistive material which is a mixture of a zero valence metal and a dielectric material, and a layer of conductive material.

Other References

  • U.S. Patent Appl. S.N. 08/691,853, filed Aug. 2, 1996, "Chemical Vapor Deposition and Powder Formation Using Thermal Spray with near supercrtical and supercritical fluid solutions" Hunt et al.
  • U.S. Patent App. S.N. 08/691,853, filed Aug. 2,1996, "Chemical Vapor Deposition and Powder Formation Using Thermal Spray With Near Supercritical and Supercritical Fluid Solutions", Hunt et a
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