Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement
Patent 6191880 Issued on February 20, 2001. Estimated Expiration Date: 
July 14, 2019. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
July 14, 2019. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3213753 3719415 Polarized light beam source in a vehicle headlight Polariscope and filter therefor Method and device for polarizing light radiation Thin film thickness measuring method Projection exposure apparatus Azimuthal and radial polarization free-electron laser system Projection exposure apparatus and polarizer 5548427 InventorAssigneeApplicationNo. 352408 filed on 07/14/1999US Classes:359/238, Light wave temporal modulation (e.g., frequency, amplitude, etc.)359/237, OPTICAL MODULATOR359/489, Polarization (direction or magnitude) varies over surface of the medium (e.g., vectograph)359/494, By birefringent element359/495, For beam deflection or splitting359/497Using plural elementsExaminersPrimary: Shafer, Ricky D.Attorney, Agent or FirmForeign Patent References
International ClassesG02B 005/30G02B 026/00 G02F 001/01 Foreign Application Priority Data1995-09-23 DEAbstractAn optical arrangement is disclosed wherein an entering beam is converted into an exiting beam having a total cross section of light which is linearly polarized essentially in the radial direction by rotation. For this purpose, rasters of half-wave plates (41, 42, 4i), a combination of birefringent quarter-wave plate 420 and a circular plate 430 is suggested in combination with a conical polarizer 21'. This arrangement is preferably utilized in the illumination portion of a microlithographic projection exposure system. It is important that the arrangement be mounted behind all asymmetric or polarizing component elements 103a.Other References
Field of SearchPOLARIZATION WITHOUT MODULATIONLight polarization without any external input Polarization (direction or magnitude) varies over surface of the medium (e.g., vectograph) By dichroic medium Glare prevention by discriminating against polarized light By birefringent element For beam deflection or splitting Prisms Using plural elements Using plural mediums With particular direction of the field in relation to the medium, beam direction or polarization With particular electrode structure or arrangement, or medium mounting structure or arrangement With birefringent element OPTICAL MODULATOR Light wave temporal modulation (e.g., frequency, amplitude, etc.) | |
