Alignment correction prior to image sampling in inspection systems
June 27, 2017. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3851951 Automatic photomask inspection system and apparatus Photomask inspection apparatus and method with improved defect detection Method and apparatus for automatic wafer inspection Electronic control of an automatic wafer inspection system Automatic photomask and reticle inspection method and apparatus including improved defect detector and alignment sub-systems Reticle inspection system Electron beam inspection system and method Automated photomask inspection apparatus and method Automated photomask inspection apparatus InventorsAssigneeApplicationNo. 884466 filed on 06/27/1997US Classes:348/87, Electronic circuit chip or board (e.g., positioning)348/126Of electronic circuit chip or boardExaminersPrimary: Lee, YoungAttorney, Agent or FirmInternational ClassH04N 007/18AbstractA method and apparatus, and variations of each, for inspecting a wafer defining at least one die thereon is disclosed. The present invention first obtains the electronic image equivalent of two die, and then determines the x and y offset between those electronic images. Prior to inspection for defects, those two electronic images are aligned by adjusting the x and y positions of one electronic image of one die with respect to the electronic image of the other die. Once that is accomplished, those electronic images are compared to detect any defects that may exist on one of the die.Field of SearchElectronic circuit chip or board (e.g., positioning)SPECIAL APPLICATIONS Manufacturing Web, sheet or filament Quality inspection Position detection Alignment or positioning Flaw detector Of electronic circuit chip or board Of transparent container or content (e.g., bottle, jar, etc.) Of surface (e.g., texture or smoothness, etc.) By comparison with reference object With stored representation of reference object | |
