U.S. patents available from 1976 to present.
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Projection exposure apparatus including an illumination optical system that forms a secondary light source with a particular intensity distribution

Patent 6128068 Issued on October 3, 2000. Estimated Expiration Date: Icon_subject October 3, 2017. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3729252

3776633

3887816

Light illumination device
Patent #: 4497015
Issued on: 01/29/1985
Inventor: Konno ,   et al.

Exposure apparatus
Patent #: 4521082
Issued on: 06/04/1985
Inventor: Suzuki ,   et al.

Exposure apparatus
Patent #: 4589769
Issued on: 05/20/1986
Inventor: Matsuki

Illumination optical arrangement
Patent #: 4619508
Issued on: 10/28/1986
Inventor: Shibuya ,   et al.

Optical apparatus using polarized light
Patent #: 4634240
Issued on: 01/06/1987
Inventor: Suzuki ,   et al.

Observation apparatus with selective light diffusion
Patent #: 4645924
Issued on: 02/24/1987
Inventor: Suzuki ,   et al.

Projection exposure apparatus
Patent #: 4780747
Issued on: 10/25/1988
Inventor: Suzuki ,   et al.

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Inventors

Assignee

Application

No. 467149 filed on 06/06/1995

US Classes:

355/53Step and repeat

Examiners

Primary: Braun, Fred L.

Attorney, Agent or Firm

Foreign Patent References

  • 0 293 643 EP. 12/12/1988
  • 0293643 EP. 12/12/1988
  • 0 346 844 EP. 12/12/1989
  • 0346844 EP. 12/12/1989
  • 0437376 EP. 07/12/1991
  • 2835363 DE. 03/12/1980
  • 3933308 DE. 05/12/1990
  • 61-91662 JP 05/12/1986
  • 61-210627 JP. 09/12/1986
  • 61-91662 JP. 09/12/1986

International Class

G03B 027/42

Foreign Application Priority Data

1991-02-22 JP

Abstract

An exposure apparatus for forming an image of a fine pattern having linear features extending in orthogonal first and second directions. The apparatus includes an illumination optical system for illuminating the pattern, the illumination optical system including a device for forming a secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively, wherein the secondary light source includes four sections being distributed in four quadrants defined by the center and the first and second axes, a projection optical system for projecting, on an image plane, an image of the pattern illuminated with light from the secondary light source, and a quartered detector, having four detector sections, for detecting a light quantity distribution of the secondary light source. Each of the four detector sections of the quartered detector independently detects a light quantity of a corresponding one of the four sections of the secondary light source.

Other References

  • Victor Pol, et al., "Excimer Laser Based Lithography: A Deep-Ultraviolet Wafer Stepper for VLSI Processing", Optical Engineering, vol. 26, No. 4, pp. 311-318, Apr. 1987
  • S.T. Yang, et al., "Effect of Central Obscuration on Image Formation in Projection Lithography", SPIE vol. 1264 Optical/Laser Microlithography III, pp. 477-485, 1990
  • Hecht & Zajac, Optics, 1st Edition, p. 117, 1974
  • Int. Cl., 5th Edition, vol. 7, Section G, pp. 68 and 72, 1989
  • E. Glatzel, "New Lenses for Microlithography", SPIE, vol. 237, p. 310, International Lens Design Conference (OSA), 198
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