Recording medium and process for forming medium
Patent 6103454 Issued on August 15, 2000. Estimated Expiration Date: 
March 24, 2018. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
March 24, 2018. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3389114 3428599 3474070 3479316 Polymeric based composition Organopolysiloxane resins of increased hardness Preparation of organopolysiloxane resins with weak organic bases Solventless liquid organopolysiloxanes Tintable scratch resistant coating Hologram recording medium InventorsApplicationNo. 046822 filed on 03/24/1998US Classes:430/290, Light scattering or refractive index image formation359/3, Having particular recording medium430/1, HOLOGRAPHIC PROCESS, COMPOSITION, OR PRODUCT430/2, Composition or product or process of making the same430/270.1, Radiation sensitive composition or product or process of making430/271.1, Identified backing or protective layer containing430/281.1Radiation sensitive composition comprising ethylenically unsaturated compoundExaminersPrimary: Angebranndt, MartinAttorney, Agent or FirmForeign Patent References
International ClassG03H 001/02AbstractThe photorecording medium of the invention is formed by mixing a matrix precursor and a photoactive monomer, and curing the mixture to form the matrix in situ. The reaction by which the matrix precursor is polymerized during the cure is independent from the reaction by which the photoactive monomer is polymerized during writing of data. In addition, the matrix polymer and the polymer resulting from polymerization of the photoactive monomer are compatible with each other. Use of a matrix precursor and photoactive monomer that polymerize by independent reactions substantially prevents cross-reaction between the photoactive monomer and the matrix precursor during the cure and inhibition of subsequent monomer polymerization. Use of a matrix precursor and photoactive monomer that result in compatible polymers substantially avoids phase separation. And in situ formation allows fabrication of media with desirable thicknesses.Other References
Field of SearchHOLOGRAPHIC SYSTEM OR ELEMENTHaving particular recording medium Hardware for producing a hologram HOLOGRAPHIC PROCESS, COMPOSITION, OR PRODUCT Composition or product or process of making the same Light scattering or refractive index image formation LASER BEAM Radiation sensitive composition comprising ethylenically unsaturated compound Radiation sensitive composition or product or process of making Identified backing or protective layer containing |
| ||||||||||||||
