X-ray mask and X-ray exposure method using the same
August 27, 2017. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesX-ray mask structure X-ray mask structure and manufacturing methods including forming a metal oxide film on a portion of an X-ray permeable film having no X-ray absorber thereon Production method of an x-ray mask structure, an x-ray mask structure produced thereby, and a device fabricated by using the x-ray mask structure X-ray mask, and exposure apparatus and device production using the mask X-ray mask structure, process for production thereof, apparatus and method for X-ray exposure with the X-ray mask structure, and semiconductor device produced by the X-ray exposure method X-ray mask pellicle Patent #: 5793836 InventorsAssigneeApplicationNo. 917854 filed on 08/27/1997US Classes:378/35, Pattern mask378/34LithographyExaminersPrimary: Church, Craig E.Attorney, Agent or FirmForeign Patent References
International ClassG21K 005/00Foreign Application Priority Data1996-08-28 JPAbstractAn X-ray mask includes a holding frame, a membrane held by the holding frame, a pattern formed on a surface of the membrane by an X-ray absorptive material, the surface being disposed opposed to a workpiece to which the pattern is to be transferred when the mask is mounted in an exposure apparatus, a member for reinforcing the holding frame and having a portion placed closer to the workpiece than to the membrane and a pellicle provided at a side where the pattern is formed, the pellicle being attached to the portion of the member so that the pellicle is placed at the workpiece side of the membrane. | |
