Patent ReferencesMethod and apparatus for detecting wiring patterns Method and apparatus for detecting abnormal patterns Method for detecting foreign matter and device for realizing same Method of inspecting reticles and apparatus therefor Method of and apparatus for detecting foreign substances Foreign particle inspection apparatus Foreign particle inspection apparatus and method with front and back illumination Automated photomask inspection apparatus and method Automated photomask inspection apparatus Automated photomask inspection apparatus and method Patent #: 5737072 InventorsAssigneeApplicationNo. 184003 filed on 11/02/1998US Classes:356/237.4, On patterned or topographical surface (e.g., wafer, mask, circuit board)250/559.41, With foreign particle discrimination circuitry356/239.8Detection of an object or particle on surfaceExaminersPrimary: Pham, Hoa Q.Attorney, Agent or FirmForeign Patent References
International ClassG01N 021/00Foreign Application Priority Data1992-11-30 JPAbstractA reticle inspecting apparatus for inspecting a reticle for defects has a transparent or translucent substrate, a circuit pattern formed on the front surface of the substrate, and a phase shifter formed of a light-transmissive film on the front surface of the substrate. In the apparatus, a detection optical system is disposed so as not to gather directly reflected light and directly transmitted light and so as to gather scattered light and diffracted light which has been scattered and diffracted, respectively, by the reticle. This detection optical system is capable of separating the gathered light by direction of illumination using detectors, and spatial filters disposed respectively on Fourier transform planes to intercept light diffracted by straight edges of the circuit pattern, so as to form images of gathered light on the detectors. A signal processing system having a signal processing unit calculates data concerning defects on the basis of the output signals of the detectors and displays the calculated data on a display.Field of SearchINSPECTION OF FLAWS OR IMPURITIESSurface condition Detection of object or particle on surface On patterned or topographical surface (e.g., wafer, mask, circuit board) On patterned or topographical surface (e.g., wafer, mask, circuit board) Detection of an object or particle on surface With photocell detection OF LIGHT REFLECTION (E.G., GLASS) With diffusion With comparison to master, desired shape, or reference voltage | |