U.S. patents available from 1976 to present.
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Method of and apparatus for inspecting reticle for defects

Patent 6084664 Issued on July 4, 2000. Estimated Expiration Date: Icon_subject November 2, 2018. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Method and apparatus for detecting wiring patterns
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Method and apparatus for detecting abnormal patterns
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Method for detecting foreign matter and device for realizing same
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Method of inspecting reticles and apparatus therefor
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Method of and apparatus for detecting foreign substances
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Foreign particle inspection apparatus
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Foreign particle inspection apparatus and method with front and back illumination
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Automated photomask inspection apparatus and method
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Inventors

Assignee

Application

No. 184003 filed on 11/02/1998

US Classes:

356/237.4, On patterned or topographical surface (e.g., wafer, mask, circuit board)250/559.41, With foreign particle discrimination circuitry356/239.8Detection of an object or particle on surface

Examiners

Primary: Pham, Hoa Q.

Attorney, Agent or Firm

Foreign Patent References

  • 54-101390 JP. 08/12/1979
  • 56-132549 JP. 10/12/1981
  • 58-62543 JP. 04/12/1983
  • 59-65428 JP. 04/12/1984
  • 60-38827 JP. 02/12/1985
  • 60-154634 JP. 08/12/1985
  • 60-154635 JP. 08/12/1985
  • 61-104242 JP. 05/12/1986
  • 61-104244 JP. 05/12/1986
  • 61-104659 JP. 05/12/1986
  • 1-117024 JP. 05/12/1989
  • 1-153943 JP. 06/12/1989

International Class

G01N 021/00

Foreign Application Priority Data

1992-11-30 JP

Abstract

A reticle inspecting apparatus for inspecting a reticle for defects has a transparent or translucent substrate, a circuit pattern formed on the front surface of the substrate, and a phase shifter formed of a light-transmissive film on the front surface of the substrate. In the apparatus, a detection optical system is disposed so as not to gather directly reflected light and directly transmitted light and so as to gather scattered light and diffracted light which has been scattered and diffracted, respectively, by the reticle. This detection optical system is capable of separating the gathered light by direction of illumination using detectors, and spatial filters disposed respectively on Fourier transform planes to intercept light diffracted by straight edges of the circuit pattern, so as to form images of gathered light on the detectors. A signal processing system having a signal processing unit calculates data concerning defects on the basis of the output signals of the detectors and displays the calculated data on a display.

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