U.S. patents available from 1976 to present.
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System and method for pattern recognition

Patent 6081620 Issued on June 27, 2000. Estimated Expiration Date: Icon_subject August 17, 2019. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

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Inventor

Assignee

Application

No. 376771 filed on 08/17/1999

US Classes:

382/194, Counting individual pixels or pixel patterns382/181, PATTERN RECOGNITION382/192Feature counting

Examiners

Primary: Couso, Jose L.
Assistant: Do, Anh Hong

Attorney, Agent or Firm

International Class

G06K 009/46

Abstract

A method for recognizing patterns comprising extracting features from a digital image, generating a numerical representation of each feature, indexing into a look-up table using the numerical representation to determine candidate pattern-types wherein the look-up table was generated by using a number of sample patterns to generate additional patterns based on relationships between the sample patterns; and selecting among the candidate pattern-types using selected contextual information. Extracting features from a digital image comprises identifying line segments in the digital image, grouping together adjacent line segments of the image that form features, storing the coordinates of the features to a file, the coordinates of the feature define a portion of the digital image containing the feature, dividing the portion of the digital image containing the feature into a number of cells, the number of cells is less than the number of pixels in each feature. Generating a numerical representation of each feature comprises generating a count of the number of pixels that are set in each cell, assigning a value to each cell based on whether the count for the cell exceeds a threshold, and indexing into a look-up table using the numerical representations to determine candidate pattern-types for the features wherein the look-up table was generated by using a number of sample patterns and at least one transformer that generates patterns by applying the transformer to the sample patterns; to select among the candidate pattern-types with selected validation modules that determine the pattern-type of each feature.

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