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Ultra high resolution wave focusing method and apparatus and systems employing such method and apparatus

Patent 6020988 Issued on February 1, 2000. Estimated Expiration Date: Icon_subject August 3, 2018. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Method and means to cancel diffraction effects from radiation fields
Patent #: 5148315
Issued on: 09/15/1992
Inventor: Tamari

Hyperresolution optical system
Patent #: 5450237
Issued on: 09/12/1995
Inventor: Yoshida, et al.

Amplitude optical modulator using a two-electrode DFB laser structure
Patent #: 5493438
Issued on: 02/20/1996
Inventor: Gay, et al.

Superresolution scanning optical device
Patent #: 5496995
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Inventor: Kato, et al.

Surface feature mapping using high resolution C-scan ultrasonography
Patent #: 5587533
Issued on: 12/24/1996
Inventor: Schneider, et al.

Optical system with reduced focus spot size
Patent #: 5615050
Issued on: 03/25/1997
Inventor: Kant

Super-resolution scanning optical system by incoherently superimposing two beams
Patent #: 5625613
Issued on: 04/29/1997
Inventor: Kato, et al.

Surface feature mapping using high resolution C-scan ultrasonography Patent #: 5689576
Issued on: 11/18/1997
Inventor: Schneider, et al.

Inventors

Assignee

Application

No. 128611 filed on 08/03/1998

US Classes:

359/276, Amplitude modulation73/614, Of signals to pass only echoes from within test body246/264, POINT THROWERS359/246, Modulation of polarized light via modulating input signal359/558, DIFFRACTION359/562, For changing zeroth order intensity382/124Using a fingerprint

Examiners

Primary: Ben, Loha

Attorney, Agent or Firm

International Class

G02F 001/01

Abstract

An ultra high resolution wave focusing method and apparatus is disclosed. The invention provides a focusing system having an effective numerical aperture greater than that possible using known conventional focusing techniques. By the method and apparatus of the invention, a wave of arbitrary wavefront profile and wavelength λ is focused to a region of high amplitude having a spot size that approaches the fundamental limit of 0.25λ. Imaging and patterning systems employing such a wave focusing method and apparatus provide ultra high resolution and ultra small feature sizes beyond the capabilities of systems utilizing conventional focusing elements.

Other References

  • H. Fukuda et al., Can Synthetic Aperture Techniques be Applied to Optical Lithography, J. Vsc.Sci.Tech. B 14(6), Nov./Dec. 1996, pp. 4162-4166
  • M. Schrader et al., Optical Transfer Functions of 4P1 Confocal Microscopes: Theory and Experiment, Optics Letters/Vo. 22, No. 7, Apr. 1, 1997, pp. 436-43
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