Pulsed laser system
Laser pulse stacking method
Apparatus for controlling output of an excimer laser device
Output controller for laser device
Method for facilitating material application for a group of objects of a computer graphic
Very narrow band KrF laser Patent #: 5835520
ApplicationNo. 034870 filed on 03/04/1998
US Classes:372/25, Control of pulse characteristics372/57Excimer or exciplex
ExaminersPrimary: Scott, Leon Jr.
Attorney, Agent or Firm
International ClassH01S 003/00
AbstractA process for controlling pulse energy and integrated energy dose in bursts of pulses produced by an excimer laser. The energy of each pulse in each burst is measured. The rate of change of pulse energy with charging voltage is determined. A pulse energy error is determined for a previous pulse of the present burst. An integrated dose error is also determined for all previous pulses in the current burst. A charging voltage for the next pulse is determined using the pulse energy error, the integrated dose error, the rate of change of energy with charging voltage and a reference voltage. In a preferred embodiment, the rate of change of energy with voltage is determined by dithering the voltage during two pulses of each burst, once lower and once higher. The reference voltage is a voltage calculated using prior energy and voltage data. In this embodiment, the method of determining the reference voltage during a first portion of the pulse is different from the method used during a latter portion of the burst. During the first set of pulses (40 in this embodiment), for each pulse, a specified voltage calculated using voltage and energy data from a corresponding pulse in a previous burst is utilized as a prediction of the voltage needed to produce a pulse energy converging on a target pulse energy. For pulses 41 and thereafter the reference voltage for each pulse is the specified voltage for the previous pulse.