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...that two musicians were responsible for the invention of color print film? Fascinated by photography, Leopold Godowsky and Leopold Mannes worked together to produce an easy-to-use, practical color film. They worked full time as music teachers and gave concerts while experimenting during their off hours in Mannes' kitchen. Their success earned them full-time, well-paying jobs at Kodak and their efforts resulted in Kodachrome film, which was introduced in 1935.
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US Patent 5997175 - Method for determining the temperature of a semi-transparent radiating body
US Patent Issued on December 7, 1999
Estimated Patent Expiration Date:
July 22, 2019Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
Estimated Patent Expiration Date:
July 22, 2019Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.AbstractThe present invention is generally directed to a system and process for accurately determining the temperature of an object, such as a semi-conductive wafer, by sampling from the object radiation being emitted at a particular wavelength. In one embodiment, a single reflective device is placed adjacent to the radiating object. The reflective device includes areas of high reflectivity and areas of low reflectivity. The radiation being emitted by the object is sampled within both locations generating two different sets of radiation measurements. The measurements are then analyzed and a correction factor is computed based on the optical characteristics of the reflective device and the optical characteristics of the wafer. The correction factor is then used to more accurately determine the temperature of the wafer. In an alternative embodiment, if the radiating body is semi-transparent, a reflective device is placed on each side of the object, which compensates for the transparency of the object.Other References
| InventorsAssigneeApplicationNo. 359219 filed on 07/22/1999US Classes:374/126, Having emissivity compensating or specified radiating surface219/405, Including heat energy reflecting or directing means250/492.22, Pattern control374/130, Optical system structure (e.g., lens)374/131, With radiation conducting element392/416With chamberField of Search374/126, Having emissivity compensating or specified radiating surface374/130, Optical system structure (e.g., lens)374/131, With radiation conducting element118/712, WITH INDICATING, TESTING, INSPECTING, OR MEASURING MEANS118/713, With means for visual observation118/725, Substrate heater118/50.1, With means to apply electrical and/or radiant energy to work and/or coating material118/724, By means to heat or cool204/298.03, Measuring, analyzing or testing204/298.32, Measuring, analyzing or testing219/405, Including heat energy reflecting or directing means219/411, With infrared generating means219/390, Muffle-type enclosure392/411, Lamp banks (i.e., array of plural lamps)392/416, With chamber392/422, With reflector250/492.2, Irradiation of semiconductor devices250/492.22Pattern controlExaminersPrimary: Gutierrez, DiegoAssistant: Pruchnic, Stanley J. Jr. Attorney, Agent or FirmUS Patent References4919542, Emissivity correction apparatus and methodIssued on: 04/24/1990 Inventor: Nulman, et al.4979133, Pyrometer Issued on: 12/18/1990 Inventor: Arima, et al.5114242, Bichannel radiation detection method Issued on: 05/19/1992 Inventor: Gat, et al.5154512, Non-contact techniques for measuring temperature or radiation-heated objects Issued on: 10/13/1992 Inventor: Schietinger, et al.5165796, Bichannel radiation detection apparatus Issued on: 11/24/1992 Inventor: Gat, et al.5188458, Pyrometer apparatus and method Issued on: 02/23/1993 Inventor: Thompson, et al.5226732, Emissivity independent temperature measurement systems Issued on: 07/13/1993 Inventor: Nakos, et al.5249142, Indirect temperature-measurement of films formed on semiconductor wafers Issued on: 09/28/1993 Inventor: Shirakawa, et al.5255286, Multi-point pyrometry with real-time surface emissivity compensation Issued on: 10/19/1993 Inventor: Moslehi, et al.5271084, Method and device for measuring temperature radiation using a pyrometer wherein compensation lamps are used Issued on: 12/14/1993 Inventor: Vandenabeele, et al.5305416, Semiconductor processing technique, including pyrometric measurement of radiantly heated bodies Issued on: 04/19/1994 Inventor: Fiory5308161, Pyrometer apparatus for use in rapid thermal processing of semiconductor wafers Issued on: 05/03/1994 Inventor: Stein5442727, Semiconductor processing technique, including pyrometric measurement of radiantly heated bodies Issued on: 08/15/1995 Inventor: Fiory5443315, Multi-zone real-time emissivity correction system Issued on: 08/22/1995 Inventor: Lee, et al.5444815, Multi-zone lamp interference correction system Issued on: 08/22/1995 Inventor: Lee, et al.5467220, Method and apparatus for improving semiconductor wafer surface temperature uniformity Issued on: 11/14/1995 Inventor: Xu5624590, Semiconductor processing technique, including pyrometric measurement of radiantly heated bodies and an apparatus for practicing this technique Issued on: 04/29/1997 Inventor: Fiory5628564, Method and apparatus for wavevector selective pyrometry in rapid thermal processing systems Issued on: 05/13/1997 Inventor: Nenyei, et al.5660472, Method and apparatus for measuring substrate temperatures Issued on: 08/26/1997 Inventor: Peuse, et al.5738440, Combined emissivity and radiance measurement for the determination of the temperature of a radiant object Issued on: 04/14/1998 Inventor: O'Neill, et al.5874711Apparatus and method for determining the temperature of a radiating surface Issued on: 02/23/1999 Inventor: Champetier, et al. Foreign Patent References
International ClassesG01J 005/00H05B 001/02 A21B 002/00 G21K 001/06 |
