Apparatus and method for filtering light in a thermal processing chamber
July 11, 2017. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 2057776 2318533 3331941 3523179 3623712 3761678 3796182 3830194 3836751 3862397 Reflector lamp cooling and containing assemblies Temperature gradient zone melting utilizing infrared radiation Heating apparatus for temperature gradient zone melting Epitaxial radiation heated reactor Continuous chemical vapor deposition reactor Process for preparing semiconductor wafers with substantially no crystallographic slip Furnace for practising temperature gradient zone melting Semiconductor body heater Method of growing epitaxial semiconductor films utilizing radiant heating Heating apparatus having ellipsoidal reflecting mirror Apparatus for practising temperature gradient zone melting Apparatus for practicing temperature gradient zone melting Heat recovery high intensity discharge lamp constructions Infrared heating hair 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International ClassesG01J 005/06F27B 005/14 F27B 005/18 AbstractThe present invention is directed to an apparatus and process for filtering light in a thermal processing chamber. In particular, the apparatus of the present invention includes a first spectral filter spaced apart from a second spectral filter. The first spectral filter is spaced apart from the second spectral filter so as to define a cooling fluid channel therebetween through which a cooling fluid can be circulated. In order to prevent thermal radiation being emitted by the light source from interfering with the operation of a radiation sensing device contained in the chamber, the first spectral filter absorbs most of the thermal radiation being emitted by the light source at the operating wavelength of the radiation sensing device. The second spectral filter, on the other hand, is substantially transparent to thermal radiation at the operating wavelength of the radiation sensing device. If desired, various reflective coatings made from dielectric materials can also be applied to selected surfaces of the spectral filters to further prevent unwanted thermal radiation from being detected by the radiation sensing device and for preventing the spectral filters from increasing in temperature during operation of the chamber.Other References
Field of SearchIncluding heat energy reflecting or directing meansWith infrared generating means Muffle-type enclosure With means to apply electrical and/or radiant energy to work and/or coating material By means to heat or cool Substrate heater Lamp banks (i.e., array of plural lamps) With chamber Irradiation of semiconductor devices With radiation modifying member Ultraviolet or infrared source Transparent material measurement or compensation (e.g., spectral line, gas, particulate suspension Having emissivity compensating or specified radiating surface Having significant frequency limitation or relationship (e.g., peak, ratio) Ambient temperature compensated (e.g., dummy sensor) | |
