Patent ReferencesNatural lithographic fabrication of microstructures over large areas Procedure for fabrication of microstructures over large areas using physical replication Method for production of large area 2-dimensional arrays of close packed colloidal particles Patent #: 4801476 InventorsApplicationNo. 064274 filed on 04/22/1998US Classes:427/198, Deforming the base or coating or removing part of the coating257/E21.035, Characterized by their composition, e.g., multilayer masks, materials (EPO)257/E21.257, Using mask (EPO)427/430.1IMMERSION OR PARTIAL IMMERSIONExaminersPrimary: Dixon, MerrickAttorney, Agent or FirmInternational ClassesB05D 005/00660 667 659 656 AbstractMethods of nanometer pattern formation and transfer onto a selected substrate are provided wherein a selected block copolymer is coated onto the selected substrate and a component of the block copolymer is chemically modified or physically removed so that the dense periodic pattern of the block copolymer can be transferred onto the selected substrate. Substrates prepared by these methods are also provided.Other References
Field of SearchSurface bonding and/or assembly thereforSOLID PARTICLES OR FIBERS APPLIED Rotating the base Uniting particles to form continuous coating with nondiscernible particles Synthetic resin particles Localized different areas produced (e.g., printing, etc.) Deforming the base or coating or removing part of the coating Organic coating Resin, rubber, or hardenable oil containing coating Mask or stencil utilized Mask or stencil utilized IMMERSION OR PARTIAL IMMERSION | |