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...that Kleenex tissue was originally designed to be a gas mask filter? It was developed at the beginning of World War I to replace cotton, which was then in short supply as a surgical dressing.
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US Patent 5948470 - Method of nanoscale patterning and products made thereby
US Patent Issued on September 7, 1999
Estimated Patent Expiration Date:
April 22, 2018Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
Estimated Patent Expiration Date:
April 22, 2018Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.AbstractMethods of nanometer pattern formation and transfer onto a selected substrate are provided wherein a selected block copolymer is coated onto the selected substrate and a component of the block copolymer is chemically modified or physically removed so that the dense periodic pattern of the block copolymer can be transferred onto the selected substrate. Substrates prepared by these methods are also provided.Other References
| InventorsApplicationNo. 064274 filed on 04/22/1998US Classes:427/198, Deforming the base or coating or removing part of the coating257/E21.035, Characterized by their composition, e.g., multilayer masks, materials (EPO)257/E21.257, Using mask (EPO)427/430.1IMMERSION OR PARTIAL IMMERSIONField of Search156/60, Surface bonding and/or assembly therefor427/180, SOLID PARTICLES OR FIBERS APPLIED427/183, Rotating the base427/189, Uniting particles to form continuous coating with nondiscernible particles427/195, Synthetic resin particles427/197, Localized different areas produced (e.g., printing, etc.)427/198, Deforming the base or coating or removing part of the coating427/220, Organic coating427/221, Resin, rubber, or hardenable oil containing coating427/272, Mask or stencil utilized427/282, Mask or stencil utilized427/430.1IMMERSION OR PARTIAL IMMERSIONExaminersPrimary: Dixon, MerrickAttorney, Agent or FirmUS Patent References4407695, Natural lithographic fabrication of microstructures over large areasIssued on: 10/04/1983 Inventor: Deckman , et al.4512848, Procedure for fabrication of microstructures over large areas using physical replication Issued on: 04/23/1985 Inventor: Deckman , et al.4801476Method for production of large area 2-dimensional arrays of close packed colloidal particles Issued on: 01/31/1989 Inventor: Dunsmuir , et al. International ClassesB05D 005/00660 667 659 656 |
