Inspection method, inspection apparatus and method of production of semiconductor device using them
Patent 5936726 Issued on August 10, 1999. Estimated Expiration Date: 
September 9, 2017. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
September 9, 2017. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesSurface analysis system and method Patent #: 4893932 InventorsAssigneeApplicationNo. 913392 filed on 09/09/1997US Classes:356/237.2, Surface condition356/237.3, Detection of object or particle on surface356/237.4, On patterned or topographical surface (e.g., wafer, mask, circuit board)356/237.5On patterned or topographical surface (e.g., wafer, mask, circuit board)ExaminersPrimary: Kim, Robert H.Assistant: Merlino, Amanda Attorney, Agent or FirmForeign Patent References
International ClassG01N 021/00AbstractAn inspection method and apparatus for discriminating the foreign particles on the surface of a sample from the foreign particles or defects within the sample, and a semiconductor-device producing method using the inspection method and apparatus. The inspection apparatus includes a light source, a first optical system that causes the light from the source to be directed to the sample, a second optical system for condensing the light coming back from the sample, a polarizing prism for separating the condensed light into polarized components, and optical detectors, for detecting the polarized components. The two optical systems, are arranged for their optical axes to make an angle of 50° to 120° relative to each other. The foreign particles on the surface of the sample and the foreign particles or defects within the sample are respectively discriminated from each other as side scattered light and backward scattered light by utilizing the difference between the intensity ratios of the polarized light components.Field of SearchSurface conditionBore inspection (e.g., borescopes, intrascope, etc.) Having predetermined light transmission regions (e.g., holes, aperture, multiple material articles) Flexible Specific construction of distal end Detection of object or particle on surface Firearm bore inspection Having guiding means Detection of foreign material (e.g., trash, splinters, contaminants, etc.) Elongated textile product (e.g., thread, yarn, etc.) Patterned surface With adjustable head Detection of foreign matter on or in container Containers or enclosures (e.g., packages, cans, etc.) Surface condition Optical element (e.g., contact lens, prism, filter, lens, etc.) Of container contents Containers (e.g., bottles) Textile inspection Detection of an object or particle on surface Transparent or translucent material INSPECTION OF FLAWS OR IMPURITIES On patterned or topographical surface (e.g., wafer, mask, circuit board) On patterned or topographical surface (e.g., wafer, mask, circuit board) | |
