Acrylic syrup curable to a crosslinked viscoelastomeric material
August 23, 2015. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References Re24906 3565247 3575925 3615972 Polyurethane foam-backed pressure-sensitive adhesive tape Polyhalobenzylic disulfooxonium compounds Acrylic and methacrylic self-adhesive composition and radiation method of making same Acrylic-type pressure sensitive adhesives by means of ultraviolet radiation curing Thin film pattern generation by an inverse self-lifting technique Foam-like pressure-sensitive adhesive tape Inventors
ApplicationNo. 505350 filed on 08/23/1995US Classes:522/8, At least two specified rate-affecting materials containing keto group not part of a ring; or contains a nonspecified photoinitiator or photosensitizer and specified ketone containing material wherein the keto group is not part of a ring522/34, Containing ethylenic unsaturation522/35, Contained in polymeric rate-affecting material, e.g., synthetic resin, etc.522/114, Chemical reactant is ethylenically unsaturated522/121, Chemical reactant has two or more ethylenic groups522/125, Carbon and hyrogen only522/182, Carboxylic acid or derivative522/904, MONOMER OR POLYMER CONTAINS INITIATING GROUP526/328, Derived from an ethylenically unsaturated carboxylic acid526/328.5With additional monomerExaminersPrimary: Berman, Susan W.Attorney, Agent or FirmForeign Patent References
International ClassesC08J 133//08.133/10 AbstractSolute polymers in solvent monomers form a coatable syrup that can be cured to a viscoelastomeric material when radiation-sensitive -cleaving groups in either the polymer or one of the monomers are exposed to ultraviolet radiation. The solute polymers can be formed from the solvent monomers in situ or be added thereto to form the syrup.Other References
Field of SearchMONOMER OR POLYMER CONTAINS INITIATING GROUPBenzophenone group Contained in polymeric rate-affecting material, e.g., synthetic resin, etc. Carboxylic acid or derivative Chemical reactant is ethylenically unsaturated Chemical reactant has two or more ethylenic groups Carbon and hyrogen only At least two specified rate-affecting materials containing keto group not part of a ring; or contains a nonspecified photoinitiator or photosensitizer and specified ketone containing material wherein the keto group is not part of a ring Containing ethylenic unsaturation With additional monomer Derived from an ethylenically unsaturated carboxylic acid | |
