X-ray source for lithography
Patent 5892810 Issued on April 6, 1999. Estimated Expiration Date: 
April 6, 2016. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
April 6, 2016. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesCollimated x-ray source for x-ray lithographic system X-ray generator Pulsed X-ray lithography X-ray lithography system X-ray lighography system using synchrotron radiation Charged particle high frequency laser Patent #: 4817124 InventorsApplicationNo. 520229 filed on 05/09/1990US Classes:378/119, SOURCE378/210MISCELLANEOUSExaminersPrimary: Church, Craig E.Attorney, Agent or FirmInternational ClassH01J 035/00AbstractAn x-ray lithography device in which a beam of electrons interacts with a microwave field of a quasi-optical maser such as a quasi-optical gyrotron. This maser comprises a pair of spaced mirrors defining a quasi-optical cavity therebetween, with one mirror being provided with an orifice to permit extraction of the x-ray beam produced. A Bragg reflector is connected to the mirror orifice to reduce the microwave power loss from the device through the orifice. Electrons injected in the maser cavity are caused to "wiggle" by the interacting microwave field, which functions as an undulator, so as to produce a non-coherent x-ray beam that travels along the longitudinal axis of the cavity and exits through the mirror orifice.Other References
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