Spin cleaning method
Patent 5882433 Issued on March 16, 1999. Estimated Expiration Date: 
May 21, 2016. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
May 21, 2016. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesMethod for removing in a centrifuge a liquid from a surface of a substrate Moving zone Marangoni drying of wet objects using naturally evaporated solvent vapor Method for precision drying surfaces Patent #: 5715612 InventorApplicationNo. 650998 filed on 05/21/1996US Classes:134/31, Gas or vapor condensation or absorption oowork134/33Centrifugal force and/or rotated work bodyExaminersPrimary: Snay, JeffreyAttorney, Agent or FirmForeign Patent References
International ClassB08B 003/10Foreign Application Priority Data1995-05-23 JPAbstractAt first, a semiconductor wafer is held and rotated by a spin chuck, and supplied with a hydrofluoric acid solution from a chemical liquid nozzle to remove natural oxide films on the wafer. Then, the wafer is supplied with pure water for rinsing it from a rinsing nozzle while the wafer is rotated. Right before the pure water stops being supplied, the wafer is supplied with an IPA liquid from a replacing medium nozzle while the wafer is rotated. The pure water is replaced with the IPA liquid by means of the Marangoni effect and a centrifugal force. Then, the wafer is rotated at 300 rpm for one second, at 3000 rpm for four seconds, and at 5000 rpm for five seconds, in this order, to remove the IPA liquid by means of a centrifugal force. | |
