Metal complex source reagents for chemical vapor deposition
November 24, 2015. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3410710 Process for forming a metal oxide coating Hexacoordinated transition metal compounds containing at least one polyfluoroalkyl substituent Process for making sintered glasses and ceramics Chemical vapor deposition process where an alkaline earth metal organic precursor material is volatilized in the presence of an amine or ammonia and deposited onto a substrate Alkaline earth, transition and lanthanide metal inorganic salt complexes Source reagent compounds for MOCVD of refractory films containing group IIA elements Volatile organic barium, strontium and calcium compounds Stabilization of precursors for thin film deposition Metal complex source reagents for MOCVD Patent #: 5453494 InventorsAssigneeApplicationNo. 477797 filed on 06/07/1995US Classes:546/2, Heavy metal or aluminum containing505/100, HIGH TEMPERATURE (TC GREATER THAN 30 K) SUPERCONDUCTOR MATERIAL (I.E., ELEMENT, COMPOUND, OR COMPOSITION), PER SE505/124, Free metal containing546/257, Pyridine or partially hydrogenated pyridine rings are bonded directly to each other549/3, Heavy metal or aluminum containing549/206, Heavy metal or aluminum containing556/40, Plural -C(=X)- groups, wherein X is chalcogen, bonded directly to the same non-benzenoid carbons, or the enolate thereof. (e.g., beta-diketone chelates, acetylacetonates, etc.)556/42, Vanadium, niobium, or tantalum containing (V, Nb, or Ta)556/57, Chromium, molybdenum, or tungsten containing (Cr, Mo, or556/136Ruthenium, rhodium, palladium, osmium, iridium, or platinum containing (Ru, Rh, Pd, Os, Ir, or Pt)ExaminersPrimary: Kight, JohnAssistant: Kelley, Mary F. Attorney, Agent or FirmForeign Patent References
International ClassesC07F 009/00C07F 011/00 C07F 015/00 C07D 213/22 AbstractA metalorganic complex of the formula:MAy Xwherein:M is a y-valent metal;A is a monodentate or multidentate organic ligand coordinated to M which allows complexing of MAy with X;y is an integer having a value of 2, 3 or 4; each of the A ligands may be the same or different; andX is a monodentate or multidentate ligand coordinated to M and containing one or more atoms independently selected from the group consisting of atoms of the elements C, N, H, S, O and F.The metal M may be selected from the group consisting of Cu, Ba, Sr, La, Nd, Ce, Pr, Sm, Eu, Th, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Bi, Tl, Y, Pb, Ni, Pd, Pt, Al, Ga, In, Ag, Au, Co, Rh, Ir, Fe, Ru, Sn, Li, Na, K, Rb, Cs, Ca, Mg, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, and W. A may be selected from the group consisting of ଲ-diketonates and their sulfur and nitrogen analogs, ଲ-ketoesters and their sulfur and nitrogen analogs, cyclopentadienyls, alkyls, perfluoroalkyls, alkoxides, perfluoroalkoxides, and Schiff bases. X may for example comprise a ligand such as tetraglyme, tetrahydrofuran, bipyridine, crown ether, or thioether.Other References
Field of SearchRARE EARTH METAL CONTAINING (At. No. 21, 39, 57-60 or 62-71)HIGH TEMPERATURE (TC GREATER THAN 30 K) SUPERCONDUCTOR MATERIAL (I.E., ELEMENT, COMPOUND, OR COMPOSITION), PER SE Thallium (Tl) containing Bismuth (Bi) containing Free metal containing Copper (Cu) and oxygen (O) containing From organometallic precursors (e.g., acetylacetonates) Heavy metal or aluminum containing Plural -C(=X)- groups, wherein X is chalcogen, bonded directly to the same non-benzenoid carbons, or the enolate thereof. (e.g., beta-diketone chelates, acetylacetonates, etc.) Vanadium, niobium, or tantalum containing (V, Nb, or Ta) Chromium, molybdenum, or tungsten containing (Cr, Mo, or Ruthenium, rhodium, palladium, osmium, iridium, or platinum containing (Ru, Rh, Pd, Os, Ir, or Pt) Heavy metal or aluminum containing Heavy metal or aluminum containing |
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